公开(公告)号：US5292626A

公开(公告)日：1994-03-08

申请号：US750313

申请日：1991-08-27

申请人： Gerhard Buhr ,  Andreas Elsaesser ,  Hans W. Frass ,  Ernst I. Leupold

发明人： Gerhard Buhr ,  Andreas Elsaesser ,  Hans W. Frass ,  Ernst I. Leupold

IPC分类号： G03F7/32

CPC分类号： G03F7/322

摘要： The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.The developer composition gives a very good yield, makes possible short developing times and does not cause any problems due to flaky deposits of layer constituents or foaming. A process for developing positive-working, negative-working and reversible reprographic layers with the developer composition is also disclosed.

摘要翻译： 本发明涉及一种用于辐射敏感的阳性作用和负性和可逆复制层的显影剂组合物，除了辐射敏感化合物或化合物的辐射敏感组合之外，其包含作为必需成分的不溶性粘合剂的粘合剂 所述显影剂组合物的特征在于其含有（a）O-羧甲基或O，O-双羧基甲基乙二醇或适当取代的聚乙二醇，其包含2至约500个 乙二醇单元，（b）至少一种在水中显示碱性反应的化合物，其选自碱金属氢氧化物，碱金属硅酸盐，碱金属磷酸盐，碱金属硼酸盐，氢氧化铵，硅酸铵，磷酸铵和硼酸铵 ，（c）水。 显影剂组合物产生非常好的产率，使得可能短的显影时间，并且不会由于层成分的片状沉积或发泡而引起任何问题。 还公开了利用显影剂组合物开发正性，负性和可逆复制层的方法。

公开(公告)号：US5376496A

公开(公告)日：1994-12-27

申请号：US648143

申请日：1991-01-30

申请人： Andreas Elsaesser ,  Hans W. Frass ,  Dieter Mohr

发明人： Andreas Elsaesser ,  Hans W. Frass ,  Dieter Mohr

IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0233 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/108 ,  Y10S430/115

摘要： A radiation-sensitive mixture, a radiation-sensitive recording material produced from themixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains(1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and(2) a 1,2-quinone diazide and/or a combination ofa compound which forms strong acid when exposed to actinic radiation anda compound containing at least one acid-cleavable C--O--C bond.The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of --CH.sub.3-n X.sub.n units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.

摘要翻译： 公开了一种辐射敏感性混合物，由混合物生产的辐射敏感记录材料，以及使用该记录材料生产耐热和耐化学腐蚀的复制品的方法。 通常正性工作的辐射敏感性混合物包含（1）可溶于碱性水溶液的水不溶性聚合物粘合剂，和（2）1,2-醌二叠氮化物和/或形成强酸的化合物的组合 当暴露于光化辐射和含有至少一个可酸切割的COC键的化合物时。 聚合物粘合剂的分子量为约5,000至100,000，酚羟基的含量为约1至15，优选约2至10mmol / g聚合物。 其具有至少0.1，优选约0.5至2mmol / g聚合物的-CH 3-n X n单元的含量，X为卤素如氯，溴或碘，n为1,2或3.制备平版印刷版 具有热后固化性的混合物具有高的印刷速度，并具有良好的耐化学性。 也可以用混合物制备具有高耐热性的光致抗蚀剂。

公开(公告)号：US5227281A

公开(公告)日：1993-07-13

申请号：US625542

申请日：1990-12-11

申请人： Otfried Gaschler ,  Andreas Elsaesser ,  Dieter Mohr ,  Hans W. Frass

发明人： Otfried Gaschler ,  Andreas Elsaesser ,  Dieter Mohr ,  Hans W. Frass

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/20 ,  G03F7/38

CPC分类号： G03F7/38 ,  G03F7/2022

摘要： A process for producing negative copies is disclosed in which a light-sensitive or radiation-sensitive recording material comprising a layer support and a normally positive-working light-sensitive or radiation-sensitive layer applied thereto is irradiated imagewise, thermally treated, irradiated overall and then developed with an alkaline developer. Thermal treatment is carried out with water or with an aqueous solution, at temperatures in the range from about 50.degree. to 100.degree. C., preferably from 60.degree. to 90.degree. C., within a period of time varying between about 1 second and 5 minutes, preferably between 5 seconds and 1 minute, overall irradiation is performed on the optionally still hot recording material and development is thereafter carried out within a period of time varying between about 10 seconds and 2 minutes, preferably between 15 seconds and 1 minute. The process can be carried out according to the customary procedure known in the practice of positive processing, and results in perfect printing stencils.

摘要翻译： 公开了一种用于制造负片的方法，其中对包含层支撑体和施加于其上的正常正光敏感或辐射敏感层的感光或辐射敏感记录材料进行成像照射，热处理，整体辐射照射 然后用碱性显影剂显影。 热处理在水中或水溶液中进行，温度范围为约50℃至100℃，优选60℃至90℃，时间间隔约1秒至5秒 分钟，优选在5秒至1分钟之间，对任意热的记录材料进行总体照射，然后在约10秒至2分钟之间，优选15秒至1分钟之间的时间内进行显影。 该过程可以根据正面加工实践中已知的常规程序进行，并产生完美的印刷模版。

公开(公告)号：US5378584A

公开(公告)日：1995-01-03

申请号：US924750

申请日：1992-08-04

申请人： Hans W. Frass ,  Ernst-August Hackmann ,  Klaus Joerg ,  Dietmar Koenneke ,  Rudolf Neubauer ,  Andreas Elsaesser

发明人： Hans W. Frass ,  Ernst-August Hackmann ,  Klaus Joerg ,  Dietmar Koenneke ,  Rudolf Neubauer ,  Andreas Elsaesser

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/115 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/004 ,  G03F7/0226 ,  G03F7/115

摘要： A radiation-sensitive recording material, in particular for producing planographic printing plates, is disclosed. The material is composed of a layer support and a positive-working, radiation-sensitive layer having a rough surface containing at least one 1,2-quinonediazide as a radiation-sensitive compound, a polycondensate or polymer as a binder insoluble in water and soluble or swellable in aqueous-alkaline solutions, a dye and a filler. At a layer weight of 3 g/m.sup.2 or less, the radiation-sensitive layer comprises a silicic acid product having a mean grain size in the range from 3 to 5 .mu.m with an exclusion limit of 15 .mu.m as a filler in such a quantity that it exhibits a Bekk smoothness in the range from 20 to 100 seconds (determined according to DIN 53 107, Method A). The layer additionally comprises a surfactant having polysiloxane units. The recording material shows good copying properties and technical printing properties, such as an advantageous evacuation time, screen evenness, low susceptibility to air occlusions, good resolving power and a good coating structure. The invention also relates to a process for producing a planographic printing plated, using the recording material according to the invention.

摘要翻译： 公开了一种辐射敏感记录材料，特别是用于生产平版印刷版的材料。 该材料由具有粗糙表面的层载体和正性辐射敏感层组成，其具有至少一种作为辐射敏感性化合物的1,2-醌二叠氮化物，作为不溶于水和可溶性的粘合剂的缩聚物或聚合物 或在水性碱性溶液中溶胀，染料和填料。 在3g / m 2以下的层重量下，辐射敏感层包含平均粒度在3〜5μm的硅酸产品，排阻极限为15μm作为填料， 其表现为Bekk平滑度在20至100秒的范围内（根据DIN 53 107，方法A确定）。 该层还包含具有聚硅氧烷单元的表面活性剂。 记录材料具有良好的复印性能和技术打印性能，例如有利的抽真空时间，屏幕均匀性，对空气阻塞的低敏感性，良好的分辨能力和良好的涂层结构。 本发明还涉及使用根据本发明的记录材料来生产平版印刷电镀的方法。

公开(公告)号：US5753405A

公开(公告)日：1998-05-19

申请号：US674971

申请日：1996-07-03

申请人： Andreas Elsaesser ,  Gerhard Buhr

发明人： Andreas Elsaesser ,  Gerhard Buhr

IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/022 ,  G03F7/023 ,  G03F7/115

CPC分类号： G03F7/0226 ,  G03F7/022 ,  G03F7/0236 ,  G03F7/115

摘要： A positive-working recording material is disclosed that has an aluminum base and a mat-finished radiation-sensitive layer that contains a 1,2-naphthoquinone-2-diazide as radiation-sensitive compound and a binder which is insoluble in water but soluble or swellable in aqueous alkali. The radiation-sensitive 1,2-naphthoquinone-2-diazide is an ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a phenolic compound that contains at least 2, preferably at least 3, phenolic hydroxyl groups, which ester has a phenolic hydroxyl group content of at least 0.5 mmol/g and a diazo unit content of at least 1.5 mmol/g. The binder is a phenol/formaldehyde novolak that contains at least 5 mmol/g phenolic hydroxyl groups, the phenol component of which contains at least 30 mol percent m-cresol and at least 10 mol percent of at least one xylenol and which has a weight-average M.sub.w of 2,000 to 12,000 (determined by means of GPC with polystyrene as standard). The radiation-sensitive layer additionally contains at least one phenolic additive which has a molecular weight M.sub.w of not more than 600 and contains 2 to 4 uncondensed phenyl nuclei and at least 6 mmol/g phenolic hydroxyl groups.

摘要翻译： 公开了一种正面工作的记录材料，其具有铝基材和成品辐射敏感层，其包含作为辐射敏感性化合物的1,2-萘醌-2-二叠氮化合物和不溶于水但可溶于水的粘合剂， 在碱性水溶液中溶胀。 辐射敏感的1,2-萘醌-2-二叠氮化物是1,2-萘醌-2-重氮基-4-或-5-磺酸的酯，和含有至少2个，优选至少3个， 酚羟基，该酯的酚羟基含量为至少0.5mmol / g，重氮单元含量至少为1.5mmol / g。 粘合剂是含有至少5mmol / g酚羟基的苯酚/甲醛酚醛清漆，其酚组分含有至少30摩尔％间甲酚和至少10摩尔％的至少一种二甲苯酚，其重量 - 平均Mw为2,000〜12,000（通过使用聚苯乙烯作为标准的GPC测定）。 辐射敏感层另外含有至少一种酚类添加剂，其分子量Mw不大于600，并含有2至4个未稠化的苯基核和至少6mmol / g酚羟基。

公开(公告)号：US5413899A

公开(公告)日：1995-05-09

申请号：US254500

申请日：1994-06-06

申请人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

发明人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

IPC分类号： G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/021 ,  G03F7/30

CPC分类号： G03F7/022

摘要： A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

摘要翻译： 含有不溶于水但在碱性水溶液中至少溶胀或至少可溶胀的树脂粘合剂和邻萘醌二叠氮化物 - 磺酸酯的光敏混合物，该邻萘醌二叠氮化物 - 磺酸酯为式I 其中R为氢或烷基或芳基，R1为氢或1,2-萘醌-2-重氮-4-磺酰基，1,2-萘醌-2-重氮基-5-磺酰基 或7-甲氧基-1,2-萘醌-2-二叠氮-4-磺酰基，分子中定义为R1的相同或不同的萘醌二叠氮基 - 磺酰基的数目为1〜5; 可用于制备光敏抗蚀剂材料。 使用感光性混合物制造的抗蚀剂材料具有高的光敏感性和对碱性显影剂非常好的显影剂抗性，并且可以在没有水性弱碱性溶液的问题的情况下开发。

公开(公告)号：US06190825B1

公开(公告)日：2001-02-20

申请号：US09239999

申请日：1999-01-29

申请人： Steffen Denzinger ,  Andreas Elsaesser

发明人： Steffen Denzinger ,  Andreas Elsaesser

IPC分类号： G03F7023

CPC分类号： G03F7/0125 ,  C08F22/40 ,  G03F7/0233

摘要： The invention relates to polymers containing N-substituted maleimide units, to a positive- or negative-working radiation-sensitive mixture comprising a) a polymeric binder which is insoluble in water, but soluble in aqueous-alkaline solutions, and b) at least one radiation-sensitive compound, where the binder comprises a polymer containing N-substituted maleimide units of the formula (I) The invention furthermore relates to a recording material having a support and a radiation-sensitive layer, where the layer includes the mixture. The recording material is particularly suitable for the production of chemical-resistant relief recordings. The planographic printing plates produced from the recording material allow long print runs and are resistant to processing chemicals.

摘要翻译： 本发明涉及含有N-取代的马来酰亚胺单元的聚合物，其适用于正或负工作的辐射敏感混合物，其包含a）不溶于水但可溶于水性碱性溶液的聚合物粘合剂，和b）至少一种 辐射敏感性化合物，其中粘合剂包含含有式（I）的N-取代的马来酰亚胺单元的聚合物。本发明还涉及具有载体和辐射敏感层的记录材料，其中该层包括该混合物。 记录材料特别适用于生产耐化学腐蚀的记录。 由记录材料生产的平版印刷版允许长打印运行，并且耐加工化学品。

公开(公告)号：US6100016A

公开(公告)日：2000-08-08

申请号：US395961

申请日：1999-09-14

申请人： Steffen Denzinger ,  Michael Doerr ,  Klaus-Peter Konrad ,  Andreas Elsaesser ,  Paul Eckler

发明人： Steffen Denzinger ,  Michael Doerr ,  Klaus-Peter Konrad ,  Andreas Elsaesser ,  Paul Eckler

IPC分类号： C08F8/12 ,  C08F8/14 ,  C08F212/02 ,  C08F220/00 ,  C08F222/00 ,  C08K3/22 ,  C08K5/00 ,  C08L57/00 ,  G03F7/32 ,  G03C5/30

CPC分类号： G03F7/322

摘要： The invention relates to a developer for irradiated, radiation-sensitive recording materials, in particular for the production of offset printing plates, which contains water, a compound which is alkaline in aqueous solution and a copolymer which acts as an emulsifier and has units of (I) a hydrophobic vinyl compound which has at least one optionally substituted mono- or bicyclic (C.sub.6 -C.sub.14)aryl radical and (II) a hydrophilic, ethylenically unsaturated carboxylic acid. Some of the carboxyl groups of the copolymer are esterified with reaction products of (A) (C.sub.1 -C.sub.30)alkanols, (C.sub.8 -C.sub.25)alkanoic acids, (C.sub.1 -C.sub.12)-alkylphenols or di(C.sub.1 -C.sub.20)alkylamines with (B) (C.sub.2 -C.sub.4)-alkylene oxides or tetrahydrofuran, the molar ratio (A):(B) being in the range from 1:2 to 1:50. If it is intended to develop recording materials having a negative-working layer, the developer additionally contains a water-miscible organic solvent and a surface-active compound. The developer has a low initial viscosity, which increases only slowly with increasing contamination with layer components. Furthermore it shows only a particularly low tendency to foam.

摘要翻译： 本发明涉及一种用于辐射敏感记录材料的显影剂，特别是用于生产胶版印刷版，其中含有水，在水溶液中呈碱性的化合物和作为乳化剂的共聚物，并具有（ I）疏水性乙烯基化合物，其具有至少一个任选取代的单或双环（C 6 -C 14）芳基和（II）亲水性烯属不饱和羧酸。 共聚物的一些羧基用（A）（C1-C30）链烷醇，（C8-C25）链烷酸，（C1-C12） - 烷基酚或二（C1-C20）烷基胺与（B ）（C 2 -C 4） - 亚烷基氧化物或四氢呋喃，摩尔比（A）：（B）在1:2至1:50的范围内。 如果要开发具有负性层的记录材料，则显影剂另外含有水混溶性有机溶剂和表面活性化合物。 显影剂具有低的初始粘度，其随着层组分的污染增加而缓慢增加。 此外，它仅显示出特别低的泡沫趋势。

公开(公告)号：US06294298B1

公开(公告)日：2001-09-25

申请号：US09504951

申请日：2000-02-16

申请人： Steffen Denzinger ,  Michael Doerr ,  Andreas Elsaesser ,  Guenther Hultzsch ,  Allen P. Gates ,  Roland Robinson

发明人： Steffen Denzinger ,  Michael Doerr ,  Andreas Elsaesser ,  Guenther Hultzsch ,  Allen P. Gates ,  Roland Robinson

IPC分类号： G03G1328

CPC分类号： B41C1/1016 ,  B41C2201/06 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/092 ,  G03G5/10

摘要： The invention relates to a recording material for the production of an offset printing plate, having a substrate on whose front a photosensitive image layer is present and on whose back a layer of an organic polymeric material having a glass transition temperature Tg of 45° C. or more is present. The photosensitive image layer, or any top layer present thereon, has a pigment layer formed thereon.

摘要翻译： 本发明涉及一种用于生产胶版印刷板的记录材料，其上具有基材，其前面存在感光图像层，在其背面上具有玻璃化转变温度Tg为45℃的有机聚合物材料层。 或更多。 光敏图像层或其上存在的任何顶层具有在其上形成的颜料层。

公开(公告)号：US5744272A

公开(公告)日：1998-04-28

申请号：US620951

申请日：1996-03-25

申请人： Andreas Elsaesser ,  Werner Frass ,  Fritz-Feo Grabley ,  Gabor Jerling

发明人： Andreas Elsaesser ,  Werner Frass ,  Fritz-Feo Grabley ,  Gabor Jerling

IPC分类号： G03G5/05 ,  G03G13/28

CPC分类号： G03G13/283 ,  G03G13/28 ,  G03G5/0535 ,  G03G5/0546

摘要： An electrophotographic recording material comprising: an electrically conductive base layer; a photoconductive layer which can be de-coated with alkaline solutions, the photoconductive layer comprising an organic photoconductor, a sensitizer and a binder comprising a mixture of: a) a copolymer comprising units composed of a first vinyl aromatic compound and units composed of maleic anhydride and/or a maleic partial ester, and b) a copolymer comprising units composed of a second vinyl aromatic compound and units of (meth)acrylic acid.

摘要翻译： 一种电子照相记录材料，包括：导电基底层; 可以用碱溶液去除的光电导层，光电导层包含有机光电导体，敏化剂和粘合剂，其包含以下混合物：a）包含由第一乙烯基芳族化合物组成的单元和由马来酸酐组成的单元的共聚物 和/或马来酸偏酯，和b）包含由第二乙烯基芳族化合物和（甲基）丙烯酸单元组成的单元的共聚物。