公开(公告)号：US06190825B1

公开(公告)日：2001-02-20

申请号：US09239999

申请日：1999-01-29

Applicant: Steffen Denzinger ,  Andreas Elsaesser

Inventor： Steffen Denzinger ,  Andreas Elsaesser

IPC: G03F7023

CPC classification number: G03F7/0125 ,  C08F22/40 ,  G03F7/0233

Abstract: The invention relates to polymers containing N-substituted maleimide units, to a positive- or negative-working radiation-sensitive mixture comprising a) a polymeric binder which is insoluble in water, but soluble in aqueous-alkaline solutions, and b) at least one radiation-sensitive compound, where the binder comprises a polymer containing N-substituted maleimide units of the formula (I) The invention furthermore relates to a recording material having a support and a radiation-sensitive layer, where the layer includes the mixture. The recording material is particularly suitable for the production of chemical-resistant relief recordings. The planographic printing plates produced from the recording material allow long print runs and are resistant to processing chemicals.

Abstract translation: 本发明涉及含有N-取代的马来酰亚胺单元的聚合物，其适用于正或负工作的辐射敏感混合物，其包含a）不溶于水但可溶于水性碱性溶液的聚合物粘合剂，和b）至少一种 辐射敏感性化合物，其中粘合剂包含含有式（I）的N-取代的马来酰亚胺单元的聚合物。本发明还涉及具有载体和辐射敏感层的记录材料，其中该层包括该混合物。 记录材料特别适用于生产耐化学腐蚀的记录。 由记录材料生产的平版印刷版允许长打印运行，并且耐加工化学品。

公开(公告)号：US6100016A

公开(公告)日：2000-08-08

申请号：US395961

申请日：1999-09-14

Applicant: Steffen Denzinger ,  Michael Doerr ,  Klaus-Peter Konrad ,  Andreas Elsaesser ,  Paul Eckler

Inventor： Steffen Denzinger ,  Michael Doerr ,  Klaus-Peter Konrad ,  Andreas Elsaesser ,  Paul Eckler

IPC: C08F8/12 ,  C08F8/14 ,  C08F212/02 ,  C08F220/00 ,  C08F222/00 ,  C08K3/22 ,  C08K5/00 ,  C08L57/00 ,  G03F7/32 ,  G03C5/30

CPC classification number: G03F7/322

Abstract: The invention relates to a developer for irradiated, radiation-sensitive recording materials, in particular for the production of offset printing plates, which contains water, a compound which is alkaline in aqueous solution and a copolymer which acts as an emulsifier and has units of (I) a hydrophobic vinyl compound which has at least one optionally substituted mono- or bicyclic (C.sub.6 -C.sub.14)aryl radical and (II) a hydrophilic, ethylenically unsaturated carboxylic acid. Some of the carboxyl groups of the copolymer are esterified with reaction products of (A) (C.sub.1 -C.sub.30)alkanols, (C.sub.8 -C.sub.25)alkanoic acids, (C.sub.1 -C.sub.12)-alkylphenols or di(C.sub.1 -C.sub.20)alkylamines with (B) (C.sub.2 -C.sub.4)-alkylene oxides or tetrahydrofuran, the molar ratio (A):(B) being in the range from 1:2 to 1:50. If it is intended to develop recording materials having a negative-working layer, the developer additionally contains a water-miscible organic solvent and a surface-active compound. The developer has a low initial viscosity, which increases only slowly with increasing contamination with layer components. Furthermore it shows only a particularly low tendency to foam.

Abstract translation: 本发明涉及一种用于辐射敏感记录材料的显影剂，特别是用于生产胶版印刷版，其中含有水，在水溶液中呈碱性的化合物和作为乳化剂的共聚物，并具有（ I）疏水性乙烯基化合物，其具有至少一个任选取代的单或双环（C 6 -C 14）芳基和（II）亲水性烯属不饱和羧酸。 共聚物的一些羧基用（A）（C1-C30）链烷醇，（C8-C25）链烷酸，（C1-C12） - 烷基酚或二（C1-C20）烷基胺与（B ）（C 2 -C 4） - 亚烷基氧化物或四氢呋喃，摩尔比（A）：（B）在1:2至1:50的范围内。 如果要开发具有负性层的记录材料，则显影剂另外含有水混溶性有机溶剂和表面活性化合物。 显影剂具有低的初始粘度，其随着层组分的污染增加而缓慢增加。 此外，它仅显示出特别低的泡沫趋势。

公开(公告)号：US06365330B1

公开(公告)日：2002-04-02

申请号：US09412341

申请日：1999-10-05

Applicant: Thomas Leichsenring ,  Mario Boxhorn ,  Andreas Elsaesser ,  Thorsten Lifka ,  Rudolf Zertani

Inventor： Thomas Leichsenring ,  Mario Boxhorn ,  Andreas Elsaesser ,  Thorsten Lifka ,  Rudolf Zertani

IPC: G03F732

CPC classification number: G03F7/322

Abstract: The invention relates to a developer concentrate which comprises water, at least one agent which is alkaline in water and an amphoteric surfactant and additionally at least one anionic surfactant, at least one complexing agent, at least one aminoalcohol and at least one N-alkoxylated mono- or polyfunctional amine. A ready-to-use developer can be prepared from this concentrate by dilution with tap water advantageously in the ratio of from 1:0.5 to 1:10, preferably in the ratio of from 1:2 to 1:6. The developer or the replenisher is preferably used in the production of printing plates.

Abstract translation: 本发明涉及一种显影剂浓缩物，其包含水，至少一种在水中为碱性的试剂和两性表面活性剂，另外至少一种阴离子表面活性剂，至少一种络合剂，至少一种氨基醇和至少一种N-烷氧基化单 - 或多官能胺。 可以通过用自来水以1:0.5至1:10的比例稀释，优选1:2至1:6的比例，从该浓缩物中制备即用型显影剂。 显影剂或补充剂优选用于生产印刷版。

公开(公告)号：US6165685A

公开(公告)日：2000-12-26

申请号：US149044

申请日：1998-09-08

Applicant: Karin Maerz ,  Helmut Haberhauer ,  Andreas Elsaesser ,  Hans-Joachim Schlosser ,  Fritz-Feo Grabley

Inventor： Karin Maerz ,  Helmut Haberhauer ,  Andreas Elsaesser ,  Hans-Joachim Schlosser ,  Fritz-Feo Grabley

IPC: G03F7/004 ,  B41C1/10 ,  B41N1/14 ,  G03F7/00 ,  G03F7/11 ,  G03C1/76

CPC classification number: B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/20 ,  B41C2210/24 ,  B41C2210/262

Abstract: The invention relates to a recording material having a substrate and a radiation-sensitive, water-insoluble layer which contains a component absorbing IR radiation and which, after the action of infrared radiation, becomes soluble or at least swellable in an aqueous alkaline developer. A top layer which is opaque to white light but transparent to radiation in the IR range and can be removed with water or an aqueous solution is present on the radiation-sensitive layer. The recording material is substantially insensitive to daylight. By imagewise exposure to IR radiation and subsequent development with an aqueous alkaline developer, it is possible to produce a printing plate for offset printing from the recording material. If the top layer is washed off beforehand, the recording can also be carried out using conventional UV radiation.

Abstract translation: 本发明涉及具有基材和辐射敏感的水不溶性层的记录材料，其含有吸收IR辐射的组分，并且在红外线辐射的作用下，在碱性显影液的水溶液中变得可溶或至少可溶胀。 对于白光不透明但对IR范围内的辐射透明并且可以用水或水溶液除去的顶层存在于辐射敏感层上。 记录材料对日光基本不敏感。 通过用IR辐射成像曝光并随后用含水碱性显影剂显影，可以从记录材料制备用于胶版印刷的印版。 如果顶层被预先洗去，也可以使用常规的紫外线辐射进行记录。

公开(公告)号：US5994029A

公开(公告)日：1999-11-30

申请号：US50004

申请日：1998-03-30

Applicant: Guenter Brenn ,  Franz Durst ,  Andreas Elsaesser ,  Otfried Gaschler ,  Guenter Hutzsch ,  Klaus Joerg

Inventor： Guenter Brenn ,  Franz Durst ,  Andreas Elsaesser ,  Otfried Gaschler ,  Guenter Hutzsch ,  Klaus Joerg

IPC: G03B1/00 ,  B05B17/06 ,  G03C1/76 ,  G03F7/105 ,  G03F7/115 ,  G03F7/11

CPC classification number: G03F7/115 ,  B05B17/0607 ,  Y10S430/151

Abstract: The invention relates to a sheet-like radiation-sensitive recording material whose surface is a discontinuous dulling layer comprising monodisperse particles is present. The dulling layer can be produced by spraying on a dulling liquid. An apparatus comprising an oscillation generator, which can transmit oscillations to the liquid in the apparatus, and has an orifice plate which has at least one hole with a diameter of from 5 to 250 .mu.m and from which the liquid emerges in the form of at least one laminar free jet which disintegrates into monodisperse drops is suitable for this purpose. The oscillation generator is preferably a piezoelectric ceramic.

Abstract translation: 本发明涉及一种片状辐射敏感记录材料，其表面是包含单分散颗粒的不连续钝化层。 钝化层可以通过喷涂在钝化液体上来生产。 一种包括振荡发生器的装置，其能够将装置中的液体发射振荡，并且具有至少一个直径为5至250μm的孔的孔板，并且液体以 分解成单分散滴剂的至少一个层流自由射流适用于此目的。 振荡发生器优选为压电陶瓷。

公开(公告)号：US5900352A

公开(公告)日：1999-05-04

申请号：US917814

申请日：1997-08-27

Applicant: Andreas Elsaesser ,  Werner Frass ,  Jutta Bachstein

Inventor： Andreas Elsaesser ,  Werner Frass ,  Jutta Bachstein

IPC: G03F7/00 ,  G03F7/30 ,  G03F7/32 ,  G03G13/28

CPC classification number: G03G13/28 ,  G03F7/32 ,  G03F7/322

Abstract: A process for developing irradiated radiation-sensitive recording materials using an aqueous-alkaline developer which contains compounds of the formula (I) ##STR1## wherein A is H, Na, K, NH.sub.4 or NR.sub.4, whereR is a substituted or unsubstituted alkyl radical,W and X, independently of one another are H or --CH.sub.2 --COOA,Y is H or COOA andZ is H or OH,wherein the compound of the formula (I) contains at least 3 COOA units.

Abstract translation: 一种使用包含式（I）化合物的含水碱性显影剂制备照射的辐射敏感记录材料的方法，其中A是H，Na，K，NH 4或NR 4，其中R是取代或未取代的烷基，W和 X独立地为H或-CH 2 -COOA，Y为H或COOA，Z为H或OH，式（I）化合物含有至少3个COOA单元。

公开(公告)号：US5413899A

公开(公告)日：1995-05-09

申请号：US254500

申请日：1994-06-06

Applicant: Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

Inventor： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

IPC: G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/021 ,  G03F7/30

CPC classification number: G03F7/022

Abstract: A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

Abstract translation: 含有不溶于水但在碱性水溶液中至少溶胀或至少可溶胀的树脂粘合剂和邻萘醌二叠氮化物 - 磺酸酯的光敏混合物，该邻萘醌二叠氮化物 - 磺酸酯为式I 其中R为氢或烷基或芳基，R1为氢或1,2-萘醌-2-重氮-4-磺酰基，1,2-萘醌-2-重氮基-5-磺酰基 或7-甲氧基-1,2-萘醌-2-二叠氮-4-磺酰基，分子中定义为R1的相同或不同的萘醌二叠氮基 - 磺酰基的数目为1〜5; 可用于制备光敏抗蚀剂材料。 使用感光性混合物制造的抗蚀剂材料具有高的光敏感性和对碱性显影剂非常好的显影剂抗性，并且可以在没有水性弱碱性溶液的问题的情况下开发。

公开(公告)号：US5376496A

公开(公告)日：1994-12-27

申请号：US648143

申请日：1991-01-30

Applicant: Andreas Elsaesser ,  Hans W. Frass ,  Dieter Mohr

Inventor： Andreas Elsaesser ,  Hans W. Frass ,  Dieter Mohr

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0233 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/108 ,  Y10S430/115

Abstract: A radiation-sensitive mixture, a radiation-sensitive recording material produced from themixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains(1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and(2) a 1,2-quinone diazide and/or a combination ofa compound which forms strong acid when exposed to actinic radiation anda compound containing at least one acid-cleavable C--O--C bond.The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of --CH.sub.3-n X.sub.n units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.

Abstract translation: 公开了一种辐射敏感性混合物，由混合物生产的辐射敏感记录材料，以及使用该记录材料生产耐热和耐化学腐蚀的复制品的方法。 通常正性工作的辐射敏感性混合物包含（1）可溶于碱性水溶液的水不溶性聚合物粘合剂，和（2）1,2-醌二叠氮化物和/或形成强酸的化合物的组合 当暴露于光化辐射和含有至少一个可酸切割的COC键的化合物时。 聚合物粘合剂的分子量为约5,000至100,000，酚羟基的含量为约1至15，优选约2至10mmol / g聚合物。 其具有至少0.1，优选约0.5至2mmol / g聚合物的-CH 3-n X n单元的含量，X为卤素如氯，溴或碘，n为1,2或3.制备平版印刷版 具有热后固化性的混合物具有高的印刷速度，并具有良好的耐化学性。 也可以用混合物制备具有高耐热性的光致抗蚀剂。

公开(公告)号：US5275908A

公开(公告)日：1994-01-04

申请号：US646842

申请日：1991-01-28

Applicant: Andreas Elsaesser ,  Dieter Mohr

Inventor： Andreas Elsaesser ,  Dieter Mohr

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30 ,  G03C1/77 ,  G03F7/30

CPC classification number: G03F7/039 ,  G03F7/0233

Abstract: A positive-working radiation-sensitive mixture and recording material are disclosed. The mixture contains, as essential constituents, a 1,2-quinone diazide and/or a combination of a compound which forms strong acid on exposure to actinic radiation and a compound containing at least one cleavable C--O--C bond and a polymeric binder containing repeating units of formula I ##STR1## in which R.sub.1 is a hydrogen or halogen atom, or a cyanide or an alkyl group, R.sub.2, R.sub.3 are identical or different and are hydrogen, or alkyl or aryl groups, R.sub.4, R.sub.5 are identical or different and are and R.sub.6 hydrogen or halogen atoms, or alkyl, alkoxy or aryl groups, X represents the atoms necessary to complete a monocyclic or polycyclic carbocyclic aromatic ring system, and is 1, 2 or 3. The mixture yields lithographic plates having high print runs which can be thermally post-cured and which have good resistance to chemicals. The mixture also produces photoresists having good heat resistance.

Abstract translation: 公开了一种正性辐射敏感性混合物和记录材料。 该混合物作为必需成分含有1,2-醌二叠氮化物和/或暴露于光化辐射时形成强酸的化合物和含有至少一个可切割COC键的化合物和含有重复单元的聚合物粘合剂的组合 式Ⅰ（*化学结构*）其中R1是氢或卤素原子，或氰化物或烷基，R2，R3相同或不同，为氢，或烷基或芳基，R4，R5相同或相同; 不同的是和R 6氢或卤素原子，或烷基，烷氧基或芳基，X表示完成单环或多环碳环芳环体系所必需的原子，并且为1,2或3.该混合物产生具有高印刷的平版印刷版 可以进行热后固化并具有良好的抗化学性能。 该混合物还产生具有良好耐热性的光致抗蚀剂。

公开(公告)号：US5227281A

公开(公告)日：1993-07-13

申请号：US625542

申请日：1990-12-11

Applicant: Otfried Gaschler ,  Andreas Elsaesser ,  Dieter Mohr ,  Hans W. Frass

Inventor： Otfried Gaschler ,  Andreas Elsaesser ,  Dieter Mohr ,  Hans W. Frass

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/20 ,  G03F7/38

CPC classification number: G03F7/38 ,  G03F7/2022

Abstract: A process for producing negative copies is disclosed in which a light-sensitive or radiation-sensitive recording material comprising a layer support and a normally positive-working light-sensitive or radiation-sensitive layer applied thereto is irradiated imagewise, thermally treated, irradiated overall and then developed with an alkaline developer. Thermal treatment is carried out with water or with an aqueous solution, at temperatures in the range from about 50.degree. to 100.degree. C., preferably from 60.degree. to 90.degree. C., within a period of time varying between about 1 second and 5 minutes, preferably between 5 seconds and 1 minute, overall irradiation is performed on the optionally still hot recording material and development is thereafter carried out within a period of time varying between about 10 seconds and 2 minutes, preferably between 15 seconds and 1 minute. The process can be carried out according to the customary procedure known in the practice of positive processing, and results in perfect printing stencils.

Abstract translation: 公开了一种用于制造负片的方法，其中对包含层支撑体和施加于其上的正常正光敏感或辐射敏感层的感光或辐射敏感记录材料进行成像照射，热处理，整体辐射照射 然后用碱性显影剂显影。 热处理在水中或水溶液中进行，温度范围为约50℃至100℃，优选60℃至90℃，时间间隔约1秒至5秒 分钟，优选在5秒至1分钟之间，对任意热的记录材料进行总体照射，然后在约10秒至2分钟之间，优选15秒至1分钟之间的时间内进行显影。 该过程可以根据正面加工实践中已知的常规程序进行，并产生完美的印刷模版。