发明授权
- 专利标题: Method of producing a self-aligned window at recessed intersection of insulating regions
- 专利标题(中): 在绝缘区的凹口交叉处制造自对准窗的方法
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申请号: US4813申请日: 1993-01-15
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公开(公告)号: US5334550A公开(公告)日: 1994-08-02
- 发明人: David J. McElroy , Sung-Wei Lin , Manzur Gill
- 申请人: David J. McElroy , Sung-Wei Lin , Manzur Gill
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: H01L21/033
- IPC分类号: H01L21/033 ; H01L21/266 ; H01L21/28 ; H01L21/308 ; H01L21/74 ; H01L21/768 ; H01L29/423 ; H01L21/76
摘要:
An integrated circuit structure and process relating to a self-aligned window at the recessed junction of two insulating regions formed on the surface of a semiconductor body. The window may include a trench forming an isolation region between doped semiconductor regions, or may include an electrical conductor connected to a doped semiconductor region, or may include an electrical conductor separated from doped semiconductor regions by an electrical insulator. Embodiments include, but are not limited to, a field-effect transistor, a tunnelling area for a floating gate transistor, and an electrical connection to a doped area of the substrate.
公开/授权文献
- USD356378S Decorated orthopedic shoe 公开/授权日:1995-03-14
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