发明授权
- 专利标题: Polysilane monomolecular film and polysilane built-up film
- 专利标题(中): 聚硅烷单分子膜和聚硅烷成膜
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申请号: US89634申请日: 1993-07-12
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公开(公告)号: US5362559A公开(公告)日: 1994-11-08
- 发明人: Shuji Hayase , Yoshihiko Nakano , Yukihiro Mikogami , Akira Yoshizumi , Shinji Murai , Rikako Kani
- 申请人: Shuji Hayase , Yoshihiko Nakano , Yukihiro Mikogami , Akira Yoshizumi , Shinji Murai , Rikako Kani
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX3-062037 19910326; JPX3-278029 19911024; JPX3-278030 19911024; JPX3-278031 19911024
- 主分类号: B05D1/20
- IPC分类号: B05D1/20 ; C09D183/16 ; B32B5/00
摘要:
Disclosed are a polysilane monomolecular film and a polysilane built-up film formed by building up a plurality of said monomolecular films, said monomolecular film consisting of a polysilane having a repeating unit represented by general formula (1) given below: ##STR1## where, R.sup.1 represents a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms or a substituted or unsubstituted aryl group having 6 to 24 carbon atoms, R.sup.2 represents a divalent hydrocarbon group having 1 to 4 carbon atoms which can be substituted, and X represents hydroxyl group, amino group, carboxyl group, or a hydrophilic group having at least one selected from the group consisting of hydroxyl group, amino group, carboxyl group, amide linkage, ester linkage, carbamate linkage and carbonate linkage. The polysilane monomolecular film and built-up film can be formed on a substrate by an LB technique. In the films, the molecules of the polysilane having the repeating unit (1), that is, the Si-Si backbones are oriented in a fixed direction.
公开/授权文献
- US5974847A Superplastic forming process 公开/授权日:1999-11-02
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