发明授权
US5364967A Aromatic diamine compounds, bismalemide compounds, thermosetting resin
forming compositions therefrom, resin therefrom, and methods for their
preparation
失效
芳族二胺化合物，双哩组胺化合物，由其形成的热固性树脂组合物，其树脂及其制备方法
- 专利标题： Aromatic diamine compounds, bismalemide compounds, thermosetting resin forming compositions therefrom, resin therefrom, and methods for their preparation
- 专利标题（中）： 芳族二胺化合物，双哩组胺化合物，由其形成的热固性树脂组合物，其树脂及其制备方法
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申请号： US5276申请日： 1993-01-19
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公开(公告)号： US5364967A公开(公告)日： 1994-11-15
- 发明人: Keizaburo Yamaguchi , Tatsuhiro Urakami , Yoshimitsu Tanabe , Midori Yamazaki , Shoji Tamai , Norimasa Yamaya , Masahiro Ohta , Akihiro Yamaguchi
- 申请人： Keizaburo Yamaguchi , Tatsuhiro Urakami , Yoshimitsu Tanabe , Midori Yamazaki , Shoji Tamai , Norimasa Yamaya , Masahiro Ohta , Akihiro Yamaguchi
- 申请人地址： JPX Tokyo
- 专利权人： Mitsui Toatsu Chemicals, Inc.
- 当前专利权人： Mitsui Toatsu Chemicals, Inc.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX1-275050 19891024; JPX2-052779 19900306; JPX2-119679 19900511; JPX2-132711 19900524; JPX2-177158 19900706; JPX2-177517 19900706; JPX2-210246 19900810
- 主分类号： C07C201/12
- IPC分类号： C07C201/12 ; C07C205/38 ; C07C213/02 ; C07C217/90 ; C07D207/44 ; C07D207/452 ; C08G73/12 ; C07C211/50
摘要：
Disclosed is an aromatic diamine compound represented by the formula (I) ##STR1## wherein R is H or CH.sub.3. Also disclosed is a bismaleimide compound represented by the formula (IV) ##STR2## wherein R is H or CH.sub.3, A resin forming composition comprising these compounds is also disclosed. The compounds are useful as raw materials for resins, and the resin forming composition and the resin can provide excellent heat resistance and impact resistance and low hygroscopicity.
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