发明授权
- 专利标题: Apparatus for liquid-phase epitaxial growth
- 专利标题(中): 液相外延生长装置
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申请号: US897169申请日: 1992-06-11
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公开(公告)号: US5366552A公开(公告)日: 1994-11-22
- 发明人: Masato Yamada , Takao Takenaka , Masahisa Endo
- 申请人: Masato Yamada , Takao Takenaka , Masahisa Endo
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-170501 19910614
- 主分类号: C30B19/06
- IPC分类号: C30B19/06 ; H01L21/208
摘要:
A method and an apparatus capable of efficiently producing an epitaxial layer grown at one time on a multiplicity of substrates with uniform thickness and quality are disclosed, in which a sealable growth chamber filled in a solution used to achieve liquid-phase epitaxial growth and holding therein at least one row of thin plate-like substrate is turned about the horizontal axis. The growth chamber is tilted or overturned so that the solution in the growth chamber is stirred homogeneously and the effect of gravity on the solution is excluded. A solution chamber for holding therein the solution is connected with the growth chamber via a gate valve. After the liquid-phase epitaxial growth, the growth chamber is overturned and then the gate valve is opened so that the solution in the growth chamber returns to the solution chamber. Thus, reuse of the solution is possible.
公开/授权文献
- US5944404A Defined orientation slide projector and slides 公开/授权日:1999-08-31
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