发明授权
US5371380A Si- and/or Ge-containing non-single crystalline semiconductor film with
an average radius of 3.5 A or less as for microvoids contained therein
and a microvoid density 1.times.10.sup.(19) (cm.sup.-3) or less
失效
平均半径为3.5A或更小的含Si和/或Ge的非单晶半导体膜,对于其中所含的微孔,微孔密度为1×10(19)(cm-3)或更小
- 专利标题: Si- and/or Ge-containing non-single crystalline semiconductor film with an average radius of 3.5 A or less as for microvoids contained therein and a microvoid density 1.times.10.sup.(19) (cm.sup.-3) or less
- 专利标题(中): 平均半径为3.5A或更小的含Si和/或Ge的非单晶半导体膜,对于其中所含的微孔,微孔密度为1×10(19)(cm-3)或更小
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申请号: US188731申请日: 1994-01-31
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公开(公告)号: US5371380A公开(公告)日: 1994-12-06
- 发明人: Keishi Saito , Tatsuyuki Aoike , Mitsuyuki Niwa , Toshimitsu Kariya , Yuzo Koda
- 申请人: Keishi Saito , Tatsuyuki Aoike , Mitsuyuki Niwa , Toshimitsu Kariya , Yuzo Koda
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX4-119844 19920415; JPX4-119846 19920415
- 主分类号: H01L21/205
- IPC分类号: H01L21/205 ; H01L29/16 ; H01L29/26 ; H01L45/00
摘要:
A non-single crystalline semiconductor containing at least one kind of atoms selected from the group consisting of silicon atoms (Si) and germanium atoms (Ge) as a matrix, and at least one kind of atoms selected from the group consisting of hydrogen atoms (H) and halogen atoms (X), wherein said non-single crystalline semiconductor has an average radius of 3.5 .ANG. or less and a density of 1.times.10.sup.19 (cm.sup.-3) or less as for microvoids contained therein. The non-single crystalline semiconductor excels in semiconductor characteristics and adhesion with other materials and are effectively usable as a constituent element of various semiconductor devices.
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