发明授权
- 专利标题: Methods for patterned deposition on a substrate
- 专利标题(中): 在衬底上图案化沉积的方法
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申请号: US65211申请日: 1993-05-20
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公开(公告)号: US5380474A公开(公告)日: 1995-01-10
- 发明人: Robert R. Rye , Antonio J. Ricco , M. J. Hampden-Smith , T. T. Kodas
- 申请人: Robert R. Rye , Antonio J. Ricco , M. J. Hampden-Smith , T. T. Kodas
- 申请人地址: NM Albuquerque
- 专利权人: Sandia Corporation
- 当前专利权人: Sandia Corporation
- 当前专利权人地址: NM Albuquerque
- 主分类号: C23C16/02
- IPC分类号: C23C16/02 ; C23C16/04 ; C23C16/18 ; C23C18/16 ; H05K1/03 ; H05K3/14 ; H05K3/18 ; H05K3/38 ; B05D3/06
摘要:
A method is described for patterned depositions of a material onto a substrate. A surface of a polymeric substrate is first etched so as to form an etched layer having enhanced adhesions characteristics and then selected portions of the etched layer are removed so as to define a pattern having enhanced and diminished adhesion characteristics for the deposition of a conductor onto the remaining etched layer. In one embodiment, a surface of a PTFE substrate is chemically etched so as to improve the adhesion of copper thereto. Thereafter, selected portions of the etched surface are irradiated with a laser beam so as to remove the etched selected portions of the etched surface and form patterns of enhanced and diminished adhesion of copper thereto.
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