发明授权
- 专利标题: Method for testing quality of silicon wafer
- 专利标题(中): 测试硅片质量的方法
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申请号: US850916申请日: 1992-03-13
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公开(公告)号: US5386796A公开(公告)日: 1995-02-07
- 发明人: Izumi Fusegawa , Hirotoshi Yamagishi , Nobuyoshi Fujimaki , Yukio Karasawa
- 申请人: Izumi Fusegawa , Hirotoshi Yamagishi , Nobuyoshi Fujimaki , Yukio Karasawa
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-074733 19910314
- 主分类号: C30B33/10
- IPC分类号: C30B33/10 ; C30B29/06 ; C30B33/00 ; C30B15/00
摘要:
Quick and inexpensive determination of an aggregate of point defects in a grown silicon semiconductor single crystal bar is accomplished by a method which comprises cutting a wafer from a freshly grown silicon single crystal bar, etching the surface of this wafer with the mixture of hydrofluoric acid and nitric acid thereby relieving the wafer of strain, treating the wafer with the mixture of K.sub.2 Cr.sub.2 O.sub.7, hydrofluoric acid, and water thereby giving rise to pits 2 and ripple patterns 1 therein, determining the density of the pits 2 and that of the ripple patterns 1, and rating the aggregate of point defects by virtue of the correlation between the densities of the pits 1 and the ripple patterns 1 and the aggregate of point defects.
公开/授权文献
- US4128704A Photoelectrochemical energy storage system 公开/授权日:1978-12-05
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