发明授权
- 专利标题： Method for cleansing and lustering a surface
- 专利标题（中）： 清洁和光泽表面的方法
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申请号： US171155申请日： 1993-12-22
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公开(公告)号： US5399205A公开(公告)日： 1995-03-21
- 发明人: Seigo Shinohara , Kiyoshi Okamura , Tetsuo Kijima
- 申请人： Seigo Shinohara , Kiyoshi Okamura , Tetsuo Kijima
- 申请人地址： JPX Tokyo
- 专利权人： Taiho Industries Co., Ltd.
- 当前专利权人： Taiho Industries Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-356577 19921222
- 主分类号： C09G1/00
- IPC分类号： C09G1/00 ; C09G1/04 ; C09G1/12 ; C09G1/18 ; C09K3/00 ; C11D3/16 ; C11D3/20 ; C11D3/37 ; C11D3/384 ; C11D3/60 ; C11D7/22 ; C11D17/00 ; C11D17/08 ; B08B7/00 ; C23G5/00
摘要：
A method for cleansing and lustering a surface comprises spraying on the surface a cleansing-lustering agent essentially consisting of lanolin and an O/W emulsion composed of an emulsifying agent, a silicone oil and water thereby depositing a foamed mass of the cleansing-lustering agent on said surface and allowing the foamed mass to defoam spontaneously after a prescribed period of standing and cleanse the surface. A foaming cleansing-lustering agent is disclosed which essentially consists of lanolin and an O/W emulsion composed of an emulsifying agent, a silicone oil and water.
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