发明授权
US5446059A Benzimidazole-derived compounds, method for preparing the same, and
therapeutical and cosmetic uses thereof
失效
衍生自苯并咪唑的化合物,其制备方法及其治疗和美容用途
- 专利标题: Benzimidazole-derived compounds, method for preparing the same, and therapeutical and cosmetic uses thereof
- 专利标题(中): 衍生自苯并咪唑的化合物,其制备方法及其治疗和美容用途
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申请号: US142464申请日: 1994-01-10
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公开(公告)号: US5446059A公开(公告)日: 1995-08-29
- 发明人: Jean-Philippe Rocher , Daniel Cavey
- 申请人: Jean-Philippe Rocher , Daniel Cavey
- 申请人地址: FRX Valbonne
- 专利权人: Centre International de Recherches Dermatologiques Galderma (CIRD Galderma)
- 当前专利权人: Centre International de Recherches Dermatologiques Galderma (CIRD Galderma)
- 当前专利权人地址: FRX Valbonne
- 优先权: FRX9106583 19910531
- 主分类号: A61K8/49
- IPC分类号: A61K8/49 ; A61K8/00 ; A61K8/11 ; A61K31/415 ; A61K31/4184 ; A61P29/00 ; A61P37/08 ; A61Q17/00 ; A61Q19/00 ; A61Q19/10 ; C07D235/12 ; C07D235/18 ; C07F9/6506
摘要:
Benzimidazole derivatives having general formula (I), wherein R.sub.1 and R.sub.2 are a hydrogen atom, a lower alkyl radical, an OR.sub.4 radical, a lower fluoroalkyl radical or a halogen atom; R.sub.3 is a hydrogen atom, a lower alkyl radical, a halogen, a hydroxyl or a lower alkoxy radical having 1-6 carbon atoms; R.sub.4 is a hydrogen atom, a lower alkyl radical, a benzyl radical or a (II) radical, PO.sub.3 H, SO.sub.3 H or an aminoacid residue; R.sub.7 is a lower alkyl radical, a lower alkoxy radical having 1-6 carbon atoms, a --(CH.sub.2).sub.n --COOH radical where n=1-6, or the radical (III), where r' and r" are a hydrogen atom or a lower alkyl radical, or form, together with the nitrogen atom, a 5 or 6-membered heterocyclic ring optionally interrupted by a heteroatom; R.sub.5 and R.sub.6 are different and represent the OR.sub.8 radical or a mono or polycyclic cycloalkyl radical having 5-12 carbon atoms bound to the phenyl core by a tertiary carbon; R.sub.8 is a hydrogen atom, a lower alkyl radical, an acyl radical having 2-7 carbon atoms, a benzyl radical optionally substituted by one or more halogen atoms, or a benzoyl radical; and salts of said compounds obtained by adding a pharmaceutically acceptable acid or base. Said compounds may be used therapeutically, in particular in relation to inflammatory and/or immunoallergic conditions, and cosmetically to provide body and hair care.
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