Invention Grant
- Patent Title: Process for preparing disilane from monosilane by electric discharge and cryogenic trapping
- Patent Title (中): 通过放电和低温捕集从甲硅烷制备乙硅烷的方法
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Application No.: US206847Application Date: 1994-03-07
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Publication No.: US5478453APublication Date: 1995-12-26
- Inventor: Frederic Bernard , Valerie Borg , Pierre Didier , Daniel Guerin , Michel Gastiger , Pierre Karinthi , Alain Villermet , Antoine Willemot
- Applicant: Frederic Bernard , Valerie Borg , Pierre Didier , Daniel Guerin , Michel Gastiger , Pierre Karinthi , Alain Villermet , Antoine Willemot
- Applicant Address: FRX Paris
- Assignee: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
- Current Assignee: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
- Current Assignee Address: FRX Paris
- Priority: FRX9302802 19930311
- Main IPC: B01J19/08
- IPC: B01J19/08 ; C01B33/04 ; H05F3/00
Abstract:
A process for producing disilane from monosilane comprising introducing monosilane into a reaction zone in which the monosilane is subjected to an electric discharge generated by a high frequency current. The monosilane is mixed with at least one inert gas selected from the group consisting of helium and argon. The pressure of the gaseous mixture in the reaction zone is between 0.1 and 3 bar, and the gaseous mixture is contacted in the reaction zone under electric discharge with a wall cooled to a temperature which is sufficiently low for the saturation vapor pressure of the disilane to be negligible, but not low enough for the monosilane to condense at the working partial pressure. Apparatus for conducting this process is provided.
Public/Granted literature
- US06152445A Sheet conveying apparatus and method wherein the sheet is fed without contacting the discharge layer Public/Granted day:2000-11-28
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