发明授权
- 专利标题： Sputter target for cathodic atomization to produce transparent, conductive layers
- 专利标题（中）： 用于阴极雾化的溅射靶产生透明导电层
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申请号： US336769申请日： 1994-11-09
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公开(公告)号： US5480532A公开(公告)日： 1996-01-02
- 发明人: Martin Schlott , Martin Kutzner , Martin Weigert , Uwe Konietzka , Bruce Gehman , Shawn Vahlstrom
- 申请人： Martin Schlott , Martin Kutzner , Martin Weigert , Uwe Konietzka , Bruce Gehman , Shawn Vahlstrom
- 申请人地址： DEX Hanau
- 专利权人： Leybold Materials
- 当前专利权人： Leybold Materials
- 当前专利权人地址： DEX Hanau
- 优先权： DEX4407774.2 19940309
- 主分类号： C04B35/00
- IPC分类号： C04B35/00 ; C04B35/01 ; C04B35/457 ; C23C14/08 ; C23C14/34
摘要：
A target for production of transparent electrically conductive layers by cathode sputtering is produced from indium oxide-tin oxide powder mixtures or coprecipitated indium oxide-tin oxide powders. A target with especially high mechanical strength consists of an oxide ceramic material into which metallic phase components have been incorporated in a uniform and finely distributed manner and which has a density of more than 96% of the theoretical density of indium oxide/tin oxide consisting purely of oxide.
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