发明授权
- 专利标题： Method for applying photoresist
- 专利标题（中）： 光刻胶的应用方法
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申请号： US202418申请日： 1994-02-28
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公开(公告)号： US5486267A公开(公告)日： 1996-01-23
- 发明人: Stephen E. Knight , Stephen E. Luce , Thomas L. McDevitt
- 申请人： Stephen E. Knight , Stephen E. Luce , Thomas L. McDevitt
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/16
- IPC分类号： G03F7/16 ; H01L21/027 ; H01L21/285 ; H01L21/3105 ; H01L21/312 ; H01L21/00
摘要：
The invention provides a method for substrate preparation prior to applying photoresist to the substrate. A substrate, such as a TEOS-based silicon dioxide or silicon nitride film, is selected and treated with reactive oxygen. The reactive oxygen can comprise ozone or ozone plasma, for example. After treatment of the substrate, the photoresist, preferably an acid-catalyzed photoresist for use with deep UV sensitization, is applied.
公开/授权文献
- US4347806A Liquid dispensing apparatus 公开/授权日：1982-09-07
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