发明授权
- 专利标题： Photosolder resist composition
- 专利标题（中）： photoolder抗蚀剂组成
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申请号： US143058申请日： 1993-10-29
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公开(公告)号： US5506321A公开(公告)日： 1996-04-09
- 发明人: Hiroyasu Koto , Kiyonori Furuta , Eiko Nakao , Shigeo Nakamura
- 申请人： Hiroyasu Koto , Kiyonori Furuta , Eiko Nakao , Shigeo Nakamura
- 申请人地址： JPX Tokyo
- 专利权人： Ajinomoto Co., Inc.
- 当前专利权人： Ajinomoto Co., Inc.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-291670 19921029; JPX4-319649 19921130; JPX5-022903 19930210; JPX5-286199 19931022
- 主分类号： C08F2/48
- IPC分类号： C08F2/48 ; C08G59/20 ; C08G59/40 ; C09D11/033 ; C09D11/10 ; C09D11/101 ; C09D11/102 ; C09D11/106 ; C09D11/107 ; C09D11/108 ; G03F7/027 ; G03F7/038 ; H05K3/28 ; C08F224/00 ; C08F220/10
摘要：
A photosensitive resin composition or photosensitive heat-curing resin composition comprising a photocurable oligomer containing 2 or more polymerizable double bonds and a carboxyl group and a heat-curing component selected from a compound containing one polymerizable double bond and one epoxy group, a compound containing one or more polymerizable double bonds and one or more blocked isocyanate groups; a photosensitive resin composition comprising a photocurable oligomer containing a carboxyl group, a blocked isocyanate group and 2 or more polymerizable double bonds; and a novel compound containing one or more polymerizable double bonds and one or more blocked isocyanate groups are disclosed. The resin compositions have high photosensitivity, excellent developability and provide a solder resist pattern with excellent properties.
公开/授权文献
- US4333355A Pressure balanced drag turbine mass flow meter 公开/授权日：1982-06-08
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