发明授权
US5541303A 3,4'-dideoxymycaminosltylonolide derivative and process for producing
the same
失效
3,4'-二脱氧米霉素三奈乐莱衍生物及其制备方法
- 专利标题： 3,4'-dideoxymycaminosltylonolide derivative and process for producing the same
- 专利标题（中）： 3,4'-二脱氧米霉素三奈乐莱衍生物及其制备方法
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申请号： US256537申请日： 1994-07-13
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公开(公告)号： US5541303A公开(公告)日： 1996-07-30
- 发明人: Tomio Takeuchi , Sumio Umezawa , Osamu Tsuchiya , Shunji Kageyama , Toshiaki Miyake , Naoki Matsumoto , Kaichiro Kominato , Hiroshi Tanaka , Takeo Yoshioka
- 申请人： Tomio Takeuchi , Sumio Umezawa , Osamu Tsuchiya , Shunji Kageyama , Toshiaki Miyake , Naoki Matsumoto , Kaichiro Kominato , Hiroshi Tanaka , Takeo Yoshioka
- 申请人地址： JPX Tokyo
- 专利权人： Zaidan Hojin Biseibutsu Kagaku Kenkyukai
- 当前专利权人： Zaidan Hojin Biseibutsu Kagaku Kenkyukai
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-24692 19920114; JPX4-268853 19921007; JPX4-295223 19921104; JPX4-332933 19921214
- 主分类号： C07H17/08
- IPC分类号： C07H17/08
摘要：
A compound of the following formula is provided: ##STR1## wherein A represents a carbonyl group which may be protected; B represents an aldehyde group which may be protected; R.sup.1 represents a hydroxyl group which may be protected; R.sup.2 represents a hydrogen atom or acyl group; W represents a hydrogen atom, hydroxyl group, lower alkanoyloxy group or substituted sulfonyloxy group; Y represents a hydrogen atom, halogen atom, hydroxyl group or substituted sulfonyloxy group; and broken line "-------" represents a double bond or single bond. This compound is useful for producing 3,4'-dideoxymycaminosyltylonolide useful as an antimicrobial agent.
公开/授权文献
- US4892928A Hydrogenation process 公开/授权日：1990-01-09