发明授权
- 专利标题: Diamond-like carbon films from a hydrocarbon helium plasma
- 专利标题(中): 来自烃氦等离子体的类金刚石碳膜
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申请号: US483685申请日: 1995-06-07
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公开(公告)号: US5569501A公开(公告)日: 1996-10-29
- 发明人: Fredric D. Bailey , Douglas A. Buchanan , Alessandro C. Callegari , Howard M. Clearfield , Fuad E. Doany , Donis G. Flagello , Harold J. Hovel , Douglas C. Latulipe, Jr. , Naftali E. Lustig , Andrew T. S. Pomerene , Sampath Purushothaman , Christopher M. Scherpereel , David E. Seeger , Jane M. Shaw
- 申请人: Fredric D. Bailey , Douglas A. Buchanan , Alessandro C. Callegari , Howard M. Clearfield , Fuad E. Doany , Donis G. Flagello , Harold J. Hovel , Douglas C. Latulipe, Jr. , Naftali E. Lustig , Andrew T. S. Pomerene , Sampath Purushothaman , Christopher M. Scherpereel , David E. Seeger , Jane M. Shaw
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: G03F1/08
- IPC分类号: G03F1/08 ; C01B31/06 ; C08J7/06 ; C23C8/26 ; C23C8/50 ; C23C16/26 ; C23C16/27 ; C23C16/50 ; C30B29/04 ; G02B1/10 ; G11B5/255 ; H01L21/31 ; H01L21/314 ; B05D3/06 ; H05H1/24
摘要:
The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond-like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.
公开/授权文献
- US5045741A Dual-motion apparatus 公开/授权日:1991-09-03
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