发明授权
US5578132A Apparatus for heat treating semiconductors at normal pressure and low
pressure
失效
用于在正常压力和低压下热处理半导体的装置
- 专利标题: Apparatus for heat treating semiconductors at normal pressure and low pressure
- 专利标题(中): 用于在正常压力和低压下热处理半导体的装置
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申请号: US269608申请日: 1994-07-05
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公开(公告)号: US5578132A公开(公告)日: 1996-11-26
- 发明人: Kenichi Yamaga , Toshiki Kobayashi
- 申请人: Kenichi Yamaga , Toshiki Kobayashi
- 申请人地址: JPX Tokyo JPX Iwate-Ken
- 专利权人: Tokyo Electron Kabushiki Kaisha,Tokyo Electron Tohoku Kabushiki Kaisha
- 当前专利权人: Tokyo Electron Kabushiki Kaisha,Tokyo Electron Tohoku Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo JPX Iwate-Ken
- 优先权: JPX5-192771 19930707; JPX5-225071 19930819; JPX5-235854 19930830
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/455 ; C30B25/14 ; C23C16/00
摘要:
A heat treating unit for semiconductor processing is adapted to conduct normal pressure high temperature processing and low pressure thermal processing using corrosive gases. The unit includes an inner tube for receiving a boat which carries objects to be processed, an outer tube concentrically disposed outside the inner tube, a cylindrical manifold which has a gas feed port and an exhaust port, and a cap which tightly closes an opening of the manifold. The inner tube, outer tube and manifold are formed of quartz which is heat resistant and corrosion resistant, and these three components are integrally joined together by melting. The interior surface of the cap is provided with a protecting layer which is heat resistant and corrosion resistant. A connection between the cap and the manifold includes a high temperature heat resistant seal in which O-rings are cooled by a cooling system.
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