发明授权
- 专利标题： Metal ion reduction in novolak resins and photoresists
- 专利标题（中）： 酚醛清漆树脂和光致抗蚀剂中的金属离子还原
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申请号： US272962申请日： 1994-07-11
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公开(公告)号： US5594098A公开(公告)日： 1997-01-14
- 发明人: M. Dalil Rahman , Dana L. Durham
- 申请人： M. Dalil Rahman , Dana L. Durham
- 申请人地址： NJ Somerville
- 专利权人： Hoechst Celanese Corporation
- 当前专利权人： Hoechst Celanese Corporation
- 当前专利权人地址： NJ Somerville
- 主分类号： C08G8/00
- IPC分类号： C08G8/00 ; C08G8/08 ; C08G8/10 ; G03F7/023 ; H01L21/027 ; C08F6/00 ; G03C1/52
摘要：
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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