发明授权
- 专利标题: Silicon carbide static induction transistor
- 专利标题(中): 碳化硅静电感应晶体管
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申请号: US462405申请日: 1995-06-05
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公开(公告)号: US5612547A公开(公告)日: 1997-03-18
- 发明人: Rowland C. Clarke , Richard R. Siergiej , Saptharishi Sriram
- 申请人: Rowland C. Clarke , Richard R. Siergiej , Saptharishi Sriram
- 申请人地址: CA Los Angeles
- 专利权人: Northrop Grumman Corporation
- 当前专利权人: Northrop Grumman Corporation
- 当前专利权人地址: CA Los Angeles
- 主分类号: H01L29/24
- IPC分类号: H01L29/24 ; H01L29/772 ; H01L29/808 ; H01L29/812 ; H01L31/0312 ; H01L27/095 ; H01L29/80 ; H01L31/112
摘要:
A static induction transistor fabricated of silicon carbide, preferably 6H polytype, although any silicon carbide polytype may be used. The preferred static induction transistor is the recessed Schottky barrier gate type. Thus, a silicon carbide substrate is provided. Then, a silicon carbide drift layer is provided upon the substrate, wherein the drift layer has two spaced-apart protrusions or fingers which extend away from the substrate. Each protrusion of the drift layer has a source region of silicon carbide provided thereon. A gate material is then provided along the drift layer between the two protrusions. A conductive gate contact is provided upon the gate material and a conductive source contact is provided upon each source region. A conductive drain contact is provided along the substrate. Other gate types for the static induction transistor are contemplated. For example, a planar Schottky barrier gate may be employed. Furthermore, recessed or planar MOS gates may be utilized, as may a PN junction gate.
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