发明授权
US5757015A Charged-particle-beam exposure device and charged-particle-beam exposure
method
失效
带电粒子束曝光装置和带电粒子束曝光方法
- 专利标题： Charged-particle-beam exposure device and charged-particle-beam exposure method
- 专利标题（中）： 带电粒子束曝光装置和带电粒子束曝光方法
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申请号： US634410申请日： 1996-04-18
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公开(公告)号： US5757015A公开(公告)日： 1998-05-26
- 发明人: Akio Takemoto , Yoshihisa Ooaeh , Tomohiko Abe , Hiroshi Yasuda , Takamasa Satoh , Hideki Nasuno , Hidefumi Yabara , Kenichi Kawakami , Kiichi Sakamoto , Tomohiro Sakazaki , Isamu Seto , Masami Takigawa , Tatsuro Ohkawa
- 申请人： Akio Takemoto , Yoshihisa Ooaeh , Tomohiko Abe , Hiroshi Yasuda , Takamasa Satoh , Hideki Nasuno , Hidefumi Yabara , Kenichi Kawakami , Kiichi Sakamoto , Tomohiro Sakazaki , Isamu Seto , Masami Takigawa , Tatsuro Ohkawa
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX7-142037 19950608; JPX7-184231 19950720; JPX7-184233 19950720; JPX7-256396 19951003
- 主分类号： G21K5/10
- IPC分类号： G21K5/10 ; H01J37/08 ; H01J37/302 ; H01J37/304
摘要：
A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.
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