发明授权
- 专利标题： Exposure apparatus with light shielding portion for plotosensitive elements
- 专利标题（中）： 具有光敏元件遮光部分的曝光装置
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申请号： US540458申请日： 1995-10-10
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公开(公告)号： US5760881A公开(公告)日： 1998-06-02
- 发明人: Seiji Miyazaki , Kei Nara , Hiroshi Shirasu , Tsuyoshi Narabe
- 申请人： Seiji Miyazaki , Kei Nara , Hiroshi Shirasu , Tsuyoshi Narabe
- 申请人地址： JPX Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX6-275952 19941013
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00 ; H01L21/027 ; G03B27/72
摘要：
An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.
公开/授权文献
- US5103072A Submersible plasma torch 公开/授权日：1992-04-07
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