发明授权
- 专利标题: Sensors for a linear polisher
- 专利标题(中): 线性抛光机的传感器
-
申请号: US797470申请日: 1997-02-06
-
公开(公告)号: US5762536A公开(公告)日: 1998-06-09
- 发明人: Anil K. Pant , Joseph R. Breivogel , Douglas W. Young , Rahul Jairath , Erik H. Engdahl
- 申请人: Anil K. Pant , Joseph R. Breivogel , Douglas W. Young , Rahul Jairath , Erik H. Engdahl
- 申请人地址: CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: CA Fremont
- 主分类号: B24B21/04
- IPC分类号: B24B21/04 ; B24B21/08 ; B24B37/04 ; B24B49/16 ; B24B49/00 ; B24B51/00
摘要:
A technique for utilizing sensors to monitor the polishing of a semiconductor wafer when a linear polisher is utilized to polish the wafer. The sensors are distributed along the surface or are coupled to openings along the surface to monitor the on-going polishing process. The sensed information from the sensors are processed in order to provide feedback for compensating the fluid dispensing when fluid platens are used and/or the downforce exerted by the wafer carrier.