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公开(公告)号：US11559824B2
公开(公告)日：2023-01-24
申请号：US16865355
申请日：2020-05-03
发明人： René Pankoke
IPC分类号： B05D1/02 , B05B1/02 , B05D3/00 , B24B7/19 , B24B21/04 , B24B53/00 , B41M5/00 , B44C3/00 , B29C59/02 , B29C59/16 , B24B29/00
摘要： A method for manufacturing a structure on a surface of a workpiece (1) is disclosed, the method having the following steps: applying a liquid base layer (2) onto the surface of the workpiece (1); spraying on at least one droplet (3) into the not yet congealed base layer (2), wherein the at least one droplet (3) at least partially, preferably completely, penetrates into the base layer (2); fixing the base layer (2); and at least partially removing the at least one droplet (3). Further, a second method having the following steps is disclosed: spraying on at least one droplet (3) onto the surface of the workpiece (1); applying a liquid base layer (2) onto the surface of the workpiece (1), wherein the base layer (2) flows around the at least one droplet (3) and preferably at least partially covers the at least one droplet (3); fixing the base layer (2); at least partially removing the at least one droplet (3). Finally, a device for performing the methods is disclosed.
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公开(公告)号：US20210121912A1
公开(公告)日：2021-04-29
申请号：US17084218
申请日：2020-10-29
发明人： JARROD KEVIN LINE , HEIDI TURNER
摘要： A method and system for post-processing of engineered-wood fence pickets or similar fencing components. A post-processing line in the manufacturing factory or facility, or in a post-processing location, includes a special edge-sanding process and apparatus with one or more side sanders to treat the rough edges of the engineered-wood fence picket after sawing. The edge-sanding process produces a smooth side surface on the edges, significantly reduces the number of loose fibers and/or strands, and fills in and/or reduces void spaces. After sanding, the pickets on the belt pass through an apparatus for application of a primer to the processed picket edges. Acutely-angled limited fan sprayers provide complete coverage of the edges with primer at a particular coating thickness required for encapsulation and protection of the fence picket product. The limited fan sprayers may be positioned at varying angles and orientations with respect to the belt and pickets.
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公开(公告)号：US20200346484A1
公开(公告)日：2020-11-05
申请号：US16865358
申请日：2020-05-03
发明人： René PANKOKE
摘要： A method for processing a surface (2) of a workpiece (1) is disclosed. Besides, a device for performing the method is disclosed.
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公开(公告)号：US09987717B2
公开(公告)日：2018-06-05
申请号：US15051696
申请日：2016-02-24
发明人： Stephen Coelho
CPC分类号： B24B33/08 , B24B5/01 , B24B5/047 , B24B5/42 , B24B21/004 , B24B21/02 , B24B21/04 , B24B33/04
摘要： A finishing device includes a finishing belt, a finishing belt holding device, a first drive configured to rotationally drive a workpiece about a workpiece axis, and a second drive configured to oscillate the workpiece and the finishing belt relative to another along the workpiece axis. The finishing belt holding device has a holding section configured to hold a portion of the finishing belt. The portion has an active area configured to finish a circumferential workpiece surface. The portion extends in a plane which is vertical when referring to the direction of gravity and extends in a horizontal direction when referring to the direction of gravity and when viewing in the running direction of the finishing belt. The finishing device includes a workpiece holding device defining a workpiece holding axis which is vertical when referring to the direction of gravity.
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公开(公告)号：US09855640B2
公开(公告)日：2018-01-02
申请号：US15279922
申请日：2016-09-29
发明人： Stefan Krummenauer
摘要： A processing element for processing a profile-shaped or flat metallic workpiece, with the processing element designed such that a plurality of similar processing elements can be arranged one behind the other on a supporting device in the longitudinal direction of the supporting device, the supporting device can be driven in a circulating manner and the plurality of processing elements can be guided past the workpiece for surface processing at least approximately linearly by means of the supporting device. A rectangular or block-shaped main body having bearing surfaces for bearing on the supporting device is provided, and oblong ribs protruding outward in a web-like manner are provided on the main body on opposite flat longitudinal sides and overlap the corresponding opposite flat longitudinal sides of the main body on an identically embodied processing element, which is arranged between the ribs.
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公开(公告)号：US08979615B2
公开(公告)日：2015-03-17
申请号：US13308857
申请日：2011-12-01
CPC分类号： B24B21/002 , B24B9/065 , B24B21/004 , B24B21/006 , B24B21/008 , B24B21/20
摘要： The polishing apparatus has a polishing unit capable of polishing a peripheral portion of the substrate to form a right-angled cross section. The polishing apparatus includes: a substrate holder that holds and rotates the substrate; guide rollers that support a polishing tape; and a polishing head having a pressing member that presses an edge of the polishing tape against the peripheral portion of the substrate from above. The guide rollers are arranged such that the polishing tape extends parallel to a tangential direction of the substrate and a polishing surface of the polishing tape is parallel to a surface of the substrate. The substrate holder includes: a holding stage that holds the substrate; and a supporting stage that supports a lower surface of the peripheral portion of the substrate in its entirety. The supporting stage rotates in unison with the holding stage.
摘要翻译： 抛光装置具有能够抛光基板的周边部分以形成直角横截面的抛光单元。 抛光装置包括：保持和旋转衬底的衬底保持器; 支撑抛光带的导辊; 以及抛光头，其具有从上方将研磨带的边缘压靠在基板的周边部分的按压部件。 引导辊布置成使得抛光带平行于基板的切线方向延伸，并且抛光带的抛光表面平行于基板的表面。 基板保持器包括：保持基板的保持台; 以及支撑台，其整体地支撑基板的周边部分的下表面。 支撑台与保持台一致地旋转。
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公开(公告)号：US06971950B2
公开(公告)日：2005-12-06
申请号：US10689678
申请日：2003-10-22
申请人： Walter Dudovicz
发明人： Walter Dudovicz
IPC分类号： B24B21/04 , B24B37/20 , B24B37/26 , B24D11/06 , H01L21/304
CPC分类号： B24B37/205 , B24B21/04 , B24B37/26 , B24D11/06
摘要： An endless belt for a belt type polishing machine comprises a support fabric and a polymer layer of relatively low hardness. The polymer layer is formed with drainage grooves. The support fabric may comprise a non woven or woven material, or a membrane with oriented reinforcing yarns. A further version comprises a spiral-link fabric supporting a woven or non woven layer carrying the polymer layer. The polymer layer may be a double layer, the upper of which is either harder or softer than the lower layer.
摘要翻译： 用于带式抛光机的环形带包括支撑织物和相对低硬度的聚合物层。 聚合物层形成有排水槽。 支撑织物可以包括非织造或编织材料或具有取向增强纱线的膜。 另一版本包括支撑承载聚合物层的机织或非编织层的螺旋链节织物。 聚合物层可以是双层，其上部比下层更硬或更软。
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公开(公告)号：US06951507B2
公开(公告)日：2005-10-04
申请号：US10142382
申请日：2002-05-08
申请人： Homayoun Talieh
发明人： Homayoun Talieh
IPC分类号： B24B1/00 , B24B7/22 , B24B21/00 , B24B21/04 , B24B21/06 , B24B27/00 , B24B37/04 , B24B41/047 , B24B41/06 , B24B49/10 , B24B49/16 , B24B53/007
CPC分类号： B24B41/068 , B24B21/004 , B24B21/06 , B24B37/107 , B24B37/26 , B24B37/30
摘要： A chemical mechanical polishing apparatus includes a rotating plate on which a substrate received, and a polishing pad which moves across the substrate as it rotates on the plate to polish the substrate. The load of the pad against the substrate, and the rotary speed of the plate, may be varied to control the rate of material removed by the pad.
摘要翻译： 一种化学机械抛光装置，包括：接收基板的旋转板，以及抛光垫，当其在板上转动以抛光基板时，抛光垫在基板上移动。 可以改变衬垫抵靠衬底的负载和板的旋转速度，以控制衬垫移除的材料的速率。
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9.发明授权Method and apparatus for cleaning a web-based chemical mechanical planarization system 失效用于清洁基于网络的化学机械平面化系统的方法和设备公开(公告)号：US06949011B2
公开(公告)日：2005-09-27
申请号：US10231762
申请日：2002-08-28
申请人： Scott E. Moore , Dinesh Chopra
发明人： Scott E. Moore , Dinesh Chopra
IPC分类号： B24B21/04 , B24B53/007 , B24B53/017 , H01L21/00 , B24B1/00
CPC分类号： B24B53/017 , B24B21/04 , H01L21/67051
摘要： A method and apparatus for cleaning a web-based chemical-mechanical planarization (CMP) system. Specifically, a fluid spray bar is coupled to a frame assembly which may be mounted on a CMP system. The fluid spray bar will move along the frame assembly. As the fluid spray bar traverses the length of the frame assembly, a cleaning fluid is sprayed onto the web in order to clean the web between planarization cycles.
摘要翻译： 一种用于清洁基于网络的化学 - 机械平面化（CMP）系统的方法和设备。 具体地，流体喷射杆联接到可以安装在CMP系统上的框架组件。 流体喷射杆将沿框架组件移动。 当流体喷射杆穿过框架组件的长度时，将清洁流体喷洒到卷筒纸上，以便在平坦化循环之间清洁卷材。
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公开(公告)号：US06932679B2
公开(公告)日：2005-08-23
申请号：US10295197
申请日：2002-11-15
CPC分类号： B24B21/04 , B24B21/08 , B24B21/22 , B24B37/013 , B24B37/04 , B24B37/205 , B24B47/04 , B24B49/16
摘要： The present invention includes a polishing pad or belt secured to a mechanism that allows the pad or belt to move in a reciprocating manner, i.e. in both forward and reverse directions, at high speeds. The constant bidirectional movement of the polishing pad or belt as it polishes the wafer provides superior planarity and uniformity across the wafer surface. When a fresh portion of the pad is required, the pad is moved through a drive system containing rollers, such that the rollers only touch a back side of the pad, thereby minimizing sources of friction other than the wafer that is being polished from the polishing side of the pad, and maximizing the lifetime of the polishing pad.
摘要翻译： 本发明包括固定到机构的抛光垫或皮带，该机构允许垫或带以往往的方式即即向前和向后两个方向高速移动。 抛光垫或带在其抛光晶片时恒定的双向运动在晶片表面上提供了优异的平面性和均匀性。 当需要衬垫的新鲜部分时，衬垫移动通过包含辊的驱动系统，使得辊仅接触衬垫的背面，从而最小化除了从抛光抛光的晶片之外的摩擦源 并且使抛光垫的寿命最大化。
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