发明授权
- 专利标题: Device for forming deposited film
- 专利标题(中): 用于形成沉积膜的装置
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申请号: US450624申请日: 1995-05-25
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公开(公告)号: US5769950A公开(公告)日: 1998-06-23
- 发明人: Katsuji Takasu , Hisanori Tsuda , Masafumi Sano , Yutaka Hirai
- 申请人: Katsuji Takasu , Hisanori Tsuda , Masafumi Sano , Yutaka Hirai
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX60-161132 19850723; JPX60-161133 19850723; JPX60-161134 19850723; JPX60-161135 19850723; JPX60-161136 19850723; JPX60-161137 19850723; JPX60-161138 19850723
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/452 ; C23C16/48 ; C23C16/52 ; C23C16/54 ; C23C16/00
摘要:
A device for forming a deposited film is provided. It comprises (a) a reaction chamber; (b) a heating means for heating a substrate placed in the reaction chamber; (c) a starting gas introducing means for introducing starting gases into the reaction chamber, the gas introducing means having a means for introducing two or more kinds of gases alternately and intermittently into the reaction chamber; (d) a decomposing means for decomposing the starting gases in the reaction chamber so as to form a deposited film on the substrate heated by said heating means in the reaction chamber, the decomposing means having a light source which irradiates at least one kind of light into the reaction chamber to decompose the starting gases.