发明授权
- 专利标题： Mask and exposure apparatus using the same
- 专利标题（中）： 掩模和曝光装置使用它
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申请号： US687782申请日： 1996-07-31
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公开(公告)号： US5770335A公开(公告)日： 1998-06-23
- 发明人: Akira Miyake , Keiko Chiba
- 申请人： Akira Miyake , Keiko Chiba
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX7-197543 19950802
- 主分类号： G03F1/22
- IPC分类号： G03F1/22 ; G03F1/68 ; G21K1/10 ; H01L21/027 ; G03F9/00 ; G21K5/00
摘要：
A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.
公开/授权文献
- US5078213A Adjustable floating pumping system 公开/授权日：1992-01-07
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