公开(公告)号：US5770335A

公开(公告)日：1998-06-23

申请号：US687782

申请日：1996-07-31

申请人： Akira Miyake ,  Keiko Chiba

发明人： Akira Miyake ,  Keiko Chiba

IPC分类号： G03F1/22 ,  G03F1/68 ,  G21K1/10 ,  H01L21/027 ,  G03F9/00 ,  G21K5/00

CPC分类号： G21K1/10 ,  G03F1/22 ,  G03F1/29

摘要： A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.

摘要翻译： 用于辐射的掩模，包括X射线和真空紫外线之一。 掩模包括用于支撑辐射吸收材料的图案的透射构件和设置在透射构件上的移相器材料。 移相器材料的辐射吸收率小于辐射吸收材料的辐射吸收率。 在设置移相器材料的部分处的透射构件的厚度小于其另一部分的厚度。

公开(公告)号：US09063277B2

公开(公告)日：2015-06-23

申请号：US13332582

申请日：2011-12-21

申请人： Fumitaro Masaki ,  Akira Miyake

发明人： Fumitaro Masaki ,  Akira Miyake

IPC分类号： B05D5/06 ,  F21V9/04 ,  G03B27/32 ,  G03B27/54 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06 ,  B82Y10/00

CPC分类号： G02B5/0816 ,  B82Y10/00 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

摘要： A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

摘要翻译： 一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤， 第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤 通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

公开(公告)号：US08921807B2

公开(公告)日：2014-12-30

申请号：US13462013

申请日：2012-05-02

申请人： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

发明人： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

IPC分类号： H01J37/30 ,  B08B5/00 ,  H01J37/317

CPC分类号： H01J37/3177 ,  B08B5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1205

摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

摘要翻译： 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。

公开(公告)号：US08106584B2

公开(公告)日：2012-01-31

申请号：US11721807

申请日：2005-07-27

申请人： Tomoya Tabuchi ,  Akira Miyake ,  Daisuke Sakumoto

发明人： Tomoya Tabuchi ,  Akira Miyake ,  Daisuke Sakumoto

IPC分类号： H01J1/62 ,  H01L21/00

CPC分类号： H01L33/56 ,  H01L33/507 ,  H01L2224/13

摘要： A light emitting device includes a base on which a wiring conductor is formed from the top surface to the bottom surface or the side face; a light emitting chip mounted on the top surface of the base and electrically connected with the wiring conductor; a first light transmitting member which covers the light emitting chip; a second light transmitting member provided above the first light transmitting member to cover the first light transmitting member, the second light transmitting member being formed of a light transmitting material containing fluorescent materials for converting in wavelength the light emitted from the light emitting chip; and a third light transmitting member provided between the first and second light transmitting members, wherein the refractive index n1 of the first light transmitting member, the refractive index n2 of the second light transmitting member and the refractive index n3 of the third light transmitting member satisfy the relation: n3

摘要翻译： 发光器件包括从顶表面到底表面或侧面形成布线导体的基底; 发光芯片安装在基座的顶表面上并与布线导体电连接; 覆盖发光芯片的第一透光构件; 第二透光构件，设置在第一透光构件上方以覆盖第一透光构件，第二透光构件由包含荧光材料的透光材料形成，用于使波长从发光芯片发射的光转换; 以及第三透光构件，设置在第一透光构件和第二透光构件之间，其中第一透光构件的折射率n1，第二透光构件的折射率n2和第三透光构件的折射率n3满足 关系：n3

公开(公告)号：US20110096526A1

公开(公告)日：2011-04-28

申请号：US12810769

申请日：2008-12-26

申请人： Kousuke Katabe ,  Yuki Mori ,  Akira Miyake ,  Shingo Matsuura

发明人： Kousuke Katabe ,  Yuki Mori ,  Akira Miyake ,  Shingo Matsuura

IPC分类号： F21V9/16

CPC分类号： H01L33/60 ,  F21K9/64 ,  F21Y2115/10 ,  H01L33/507 ,  H01L33/64 ,  H01L2924/0002 ,  H01L2924/00

摘要： A light emitting device includes a base, a sub-mount substrate, and a frame member. The light emitting device further includes a light emitting element and a wavelength converting member. The sub-mount substrate is disposed on the base, and has an upper surface made of a ceramic sintered body. The frame member has a light reflecting portion made of porous ceramics, is disposed on the base, and surrounds the sub-mount substrate. The light emitting element is mounted on the sub-mount substrate. The wavelength converting member covers the light emitting element and the light reflecting portion of the frame member.

摘要翻译： 发光装置包括基座，副安装基板和框架构件。 发光装置还包括发光元件和波长转换构件。 副安装基板设置在基座上，具有由陶瓷烧结体构成的上表面。 框架构件具有由多孔陶瓷制成的光反射部分，设置在基座上并且包围副安装基板。 发光元件安装在副安装基板上。 波长转换部件覆盖框架部件的发光元件和光反射部。

公开(公告)号：US07785407B2

公开(公告)日：2010-08-31

申请号：US11573989

申请日：2005-08-25

申请人： Susumu Abe ,  Shizuo Ishimura ,  Takanori Kitamura ,  Yoshifumi Egawa ,  Akira Miyake ,  Takayuki Yamada ,  Tetsuya Hanamoto

发明人： Susumu Abe ,  Shizuo Ishimura ,  Takanori Kitamura ,  Yoshifumi Egawa ,  Akira Miyake ,  Takayuki Yamada ,  Tetsuya Hanamoto

IPC分类号： F02M25/08 ,  B01J20/20 ,  B01D53/04

CPC分类号： F02M25/0854 ,  B01D53/0407 ,  B01D53/0415 ,  B01D2253/102 ,  B01D2253/306 ,  B01D2253/308 ,  B01D2253/311 ,  B01D2257/704 ,  B01D2259/40086 ,  B01D2259/4516 ,  B01J20/20 ,  C01B32/336

摘要： The present invention provides an evaporated fuel gas adsorbent, an evaporated fuel gas trapping apparatus that uses the adsorbent, an activated carbon, and a process for producing the activated carbon. The evaporated fuel gas adsorbent is capable of improving adsorptivity and desorptivity by reliably preventing a temperature rise and a temperature fall caused by heat generated in response to the adsorption and desorption of evaporated fuel gas, is capable of achieving a size reduction of the device, and is capable of being easily produced. The activated carbon has high mechanical strength and high abrasive resistance, has many pores suitable to adsorb an organic solvent, especially, evaporated fuel gas, and has a high packing density. The activated-carbon producing process is industrially advantageous.

摘要翻译： 本发明提供蒸发的燃料气体吸附剂，使用吸附剂的蒸发的燃料气体捕获装置，活性炭和生产活性炭的方法。 蒸发的燃料气体吸附剂能够通过可靠地防止由于蒸发的燃料气体的吸附和解吸而产生的热而导致的温度升高和温度下降，能够提高吸附性和解吸性，能够实现装置的尺寸减小， 能够容易地生产。 活性炭具有高的机械强度和高的耐磨性，具有适用于吸附有机溶剂，特别是蒸发的燃料气体的许多孔，并且具有高的堆积密度。 活性炭生产方法在工业上是有利的。

公开(公告)号：US07349524B2

公开(公告)日：2008-03-25

申请号：US11246485

申请日：2005-10-07

申请人： Fumitaro Masaki ,  Akira Miyake

发明人： Fumitaro Masaki ,  Akira Miyake

IPC分类号： G21G4/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70175

摘要： An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.

摘要翻译： 用于产生等离子体的X射线发生器和从等离子体发射的X射线包括用于产生等离子体的单元和用于通过不同光路引入X射线的多个反射光学系统。

公开(公告)号：US07276710B2

公开(公告)日：2007-10-02

申请号：US11181192

申请日：2005-07-13

申请人： Takeshi Yamamoto ,  Akira Miyake

发明人： Takeshi Yamamoto ,  Akira Miyake

IPC分类号： A61N5/00 ,  G03B27/72

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

摘要： A light source unit supplies the light radiated from the plasma, and includes a stabilizer for reducing a fluctuation of a position of the light radiated from the plasma.

摘要翻译： 光源单元提供从等离子体辐射的光，并且包括用于减少从等离子体辐射的光的位置的波动的稳定器。

公开(公告)号：US20070002474A1

公开(公告)日：2007-01-04

申请号：US11082404

申请日：2005-03-17

申请人： Mitsuaki Amemiya ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Akira Miyake

IPC分类号： G02B5/08

CPC分类号： G02B17/0631 ,  B82Y10/00 ,  G02B5/22 ,  G02B17/0642 ,  G02B17/0663 ,  G21K2201/061

摘要： Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.

摘要翻译： 公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。 在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统， 基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

公开(公告)号：US20060138364A1

公开(公告)日：2006-06-29

申请号：US11293284

申请日：2005-12-01

申请人： Akira Miyake

发明人： Akira Miyake

IPC分类号： G01J3/10

CPC分类号： G03F7/7005 ,  B82Y10/00 ,  G03F7/70033

摘要： An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.

摘要翻译： 将X射线引入照明光学系统的X射线发生器包括多个等离子体光源和可移动地布置在多个光源中的反射器，用于切换光源并从多个光中的一个反射X射线 来源于照明光学系统，其中由从反射器发射的X射线的光轴确定的平面与将多个光源连接到反射体的线之间的角度以及电场矢量 振荡在45°和135°之间，偏振平面使对照明光学系统的X射线的反射率最大化。