A semiconductor device having thin film capacitors and containing resistance measuring elementsis disclosed. The thin film capacitor comprises a bottom electrode, a high permittivity dielectric, and a top electrode stacked on an interlayer insulation film and at least one of a plurality of contact formed in electrical contact with the substrate at the desired position of an interlayer insulation film formed on a semiconductor substrate. The bottom electrode comprises at least two layers. A resistance measuring element consists of the same materials as those of the thin film capacitor and has the same size as that of the thin film capacitor except that the resistance measuring element comprises a first electrode, the dielectric film of high permittivity, and a second electrode stacked on the interlayer insulation film and at least one of a plurality of contacts other than the above-mentioned contact for the thin film capacitor, and the topmost layer of the first electrode and the second electrode are in contact with each other through the contact provided at a portion of the dielectric film. The resistance value of the bottom electrode of the thin film capacitor is measured using electrical path through the substrate.