发明授权
- 专利标题: Vertical furnace of a semiconductor manufacturing apparatus and a boat cover thereof
- 专利标题(中): 半导体制造装置的立式炉及其船盖
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申请号: US771976申请日: 1996-12-23
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公开(公告)号: US5902103A公开(公告)日: 1999-05-11
- 发明人: Kiyohiko Maeda , Satoshi Kakizaki , Tomoshi Taniyama , Hidehiro Yanagawa , Ken-ichi Suzaki
- 申请人: Kiyohiko Maeda , Satoshi Kakizaki , Tomoshi Taniyama , Hidehiro Yanagawa , Ken-ichi Suzaki
- 申请人地址: JPX Tokyo
- 专利权人: Kokusai Electric Co., Ltd.
- 当前专利权人: Kokusai Electric Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 主分类号: H01L21/22
- IPC分类号: H01L21/22 ; C23C16/44 ; C23C16/455 ; C30B25/14 ; C30B31/16 ; H01L21/00 ; F27D5/00
摘要:
A vertical furnace for use in a semiconductor manufacturing apparatus, which comprises a heater, an outer tube, an inner tube, all being disposed concentrically in a multi-layered fashion, a boat adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover disposed internally of the inner tube concentrically therewith. The boat cover is comprised of a boat cover body and an auxiliary cover plate connected to said boat cover body with a given gap therebetween, the boat cover body having a predetermined number of slit apertures extending in a generator direction thereof, the auxiliary cover plate being disposed to cover the slit apertures. The introduced reactive gas flows in branched streams, one flowing through the inside of the boat cover and the other flowing in past the boat cover, whereby the film deposited on the wafer is improved in uniformity and homogeneity. Further, since the boat cover is provided on the inner tube in the form of a unitary body, adjustments relative thereto can be made easily, thus improving the efficiency of the maintenance works thereof.
公开/授权文献
- US4097042A Backstop construction for a stacking machine 公开/授权日:1978-06-27
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