公开(公告)号：US5902103A

公开(公告)日：1999-05-11

申请号：US771976

申请日：1996-12-23

申请人： Kiyohiko Maeda ,  Satoshi Kakizaki ,  Tomoshi Taniyama ,  Hidehiro Yanagawa ,  Ken-ichi Suzaki

发明人： Kiyohiko Maeda ,  Satoshi Kakizaki ,  Tomoshi Taniyama ,  Hidehiro Yanagawa ,  Ken-ichi Suzaki

IPC分类号： H01L21/22 ,  C23C16/44 ,  C23C16/455 ,  C30B25/14 ,  C30B31/16 ,  H01L21/00 ,  F27D5/00

CPC分类号： H01L21/67098 ,  C23C16/455 ,  C23C16/45591 ,  C30B25/14 ,  C30B31/16

摘要： A vertical furnace for use in a semiconductor manufacturing apparatus, which comprises a heater, an outer tube, an inner tube, all being disposed concentrically in a multi-layered fashion, a boat adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover disposed internally of the inner tube concentrically therewith. The boat cover is comprised of a boat cover body and an auxiliary cover plate connected to said boat cover body with a given gap therebetween, the boat cover body having a predetermined number of slit apertures extending in a generator direction thereof, the auxiliary cover plate being disposed to cover the slit apertures. The introduced reactive gas flows in branched streams, one flowing through the inside of the boat cover and the other flowing in past the boat cover, whereby the film deposited on the wafer is improved in uniformity and homogeneity. Further, since the boat cover is provided on the inner tube in the form of a unitary body, adjustments relative thereto can be made easily, thus improving the efficiency of the maintenance works thereof.

摘要翻译： 一种用于半导体制造装置的垂直炉，其包括加热器，外管，内管，全部以多层方式同心设置，适于在其上装载有晶片的情况下引入内管中的船 以及与其同心地配置在内管的内部的船盖。 船盖由船盖体和辅助盖板组成，辅助盖板在其间具有给定的间隙连接到船盖体，船盖主体具有沿其发电机方向延伸的预定数量的狭缝孔，辅助盖板为 设置成覆盖狭缝孔。 引入的反应气体以分支流流动，一个流经船盖的内部，另一个流过船盖，由此沉积在晶片上的膜的均匀性和均匀性得到改善。 此外，由于舟形盖以单体形式设置在内管上，因此可以容易地进行相对于其的调节，从而提高其维护工作的效率。

公开(公告)号：US5387265A

公开(公告)日：1995-02-07

申请号：US966721

申请日：1992-10-26

申请人： Satoshi Kakizaki ,  Toshikazu Karino ,  Shoichiro Izumi ,  Mikio Koizumi ,  Makoto Ozawa ,  Fumihide Ikeda ,  Tohru Yoshida ,  Ryoji Saito

发明人： Satoshi Kakizaki ,  Toshikazu Karino ,  Shoichiro Izumi ,  Mikio Koizumi ,  Makoto Ozawa ,  Fumihide Ikeda ,  Tohru Yoshida ,  Ryoji Saito

IPC分类号： C23C16/54 ,  H01L21/677 ,  H01L21/68 ,  C23C16/00

CPC分类号： H01L21/67757 ,  C23C16/54 ,  H01L21/67769 ,  Y10S414/14 ,  Y10T29/41

摘要： In the semiconductor manufacturing apparatus according to the present invention, there are provided a cassette stocker for accommodating wafer cassettes loaded with wafers, a reaction furnace provided with heating means, a reaction gas introducing means for introducing reaction gas into the reaction furnace, a gas discharging means for discharging exhaust gas in the reaction furnace, a boat for supporting wafers, a buffer cassette stocker for storing unprocessed wafers, a boat elevating means for inserting the boat into and retrieving the boat from the reaction furnace, a wafer transfer means for transferring wafers between the boat and the wafer cassette accommodated on the cassette stocker, and a wafer cassette transfer means for transferring wafer cassettes between the buffer cassette stocker and the cassette stocker, and the buffer cassette stocker is enclosed to provide an antioxidation area to prevent natural oxidation of the wafers in standby status.

摘要翻译： 在根据本发明的半导体制造装置中，提供一种用于容纳装载有晶片的晶片盒的盒式储存器，具有加热装置的反应炉，将反应气体引入反应炉的反应气体引入装置， 用于在反应炉中排出废气的装置，用于支撑晶片的船，用于存储未加工的晶片的缓冲盒储料器，用于将船从反应炉中插入和取回船的船升降装置，用于转移晶片的晶片传送装置 在容纳在盒式存储器上的船和晶片盒之间，以及用于在缓冲盒式存储器和盒式存储器之间传送晶片盒的晶片盒传送装置，并且缓冲盒式储存器被封闭以提供抗氧化区域以防止自然氧化 晶圆处于待机状态。