Invention Grant
- Patent Title: Cleanser composition
- Patent Title (中): 清洁剂组成
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Application No.: US789536Application Date: 1997-01-27
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Publication No.: US5922659APublication Date: 1999-07-13
- Inventor: Chikako Matsumoto , Tadashi Moriyama , Takatoshi Kobayashi , Yuichi Hioki , Takashi Imamura
- Applicant: Chikako Matsumoto , Tadashi Moriyama , Takatoshi Kobayashi , Yuichi Hioki , Takashi Imamura
- Applicant Address: JPX Tokyo
- Assignee: Kao Corporation
- Current Assignee: Kao Corporation
- Current Assignee Address: JPX Tokyo
- Priority: JPX5-238159 19930924
- Main IPC: A61K8/39
- IPC: A61K8/39 ; A61K8/55 ; A61Q5/02 ; A61Q19/10 ; C11D1/02 ; C11D1/06 ; C11D1/10 ; C11D1/34 ; C11D1/37 ; C11D3/26 ; C11D3/32
Abstract:
A cleanser composition comprising a phosphate type surfactant and an amide ether carboxylic acid as the essential components. This cleanser composition is lowly irritant to the skin etc., and excellent in lathering property, gives creamy foam in quality, and can give an excellent feeling to the skin cleansed even when it is used in hard water.
Public/Granted literature
- US4679307A Method of manufacturing a recessed gate of a semiconductor device Public/Granted day:1987-07-14
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