发明授权
US5977605A SiC Semiconductor device comprising a pn Junction with a voltage
absorbing edge
失效
SiC半导体器件包括具有电压吸收边缘的pn结
- 专利标题: SiC Semiconductor device comprising a pn Junction with a voltage absorbing edge
- 专利标题(中): SiC半导体器件包括具有电压吸收边缘的pn结
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申请号: US954165申请日: 1997-10-20
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公开(公告)号: US5977605A公开(公告)日: 1999-11-02
- 发明人: Mietek Bakowsky , Bo Bijlenga , Ulf Gustafsson , Christopher Harris , Susan Savage
- 申请人: Mietek Bakowsky , Bo Bijlenga , Ulf Gustafsson , Christopher Harris , Susan Savage
- 申请人地址: SEX Vaster.ang.s
- 专利权人: Asea Brown Boveri AB
- 当前专利权人: Asea Brown Boveri AB
- 当前专利权人地址: SEX Vaster.ang.s
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/16 ; H01L29/24 ; H01L29/861 ; H01L23/58
摘要:
A semiconductor component, which comprises a pn junction, where both the p-conducting and the n-conducting layers of the pn junction constitute doped silicon carbide layers and where the edge of at least one of the conducting layers of the pn junction, exhibits a stepwise or uniformly decreasing total charge or effective surface charge density from the initial value at the defined working junction to a zero or almost zero total charge at the outermost edge of the junction following a radial direction from the central part of the junction towards the outermost edge.
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