发明授权
US5994025A Photoresist, compounds for composing the photoresist, and method of
forming pattern by using the photoresist
失效
光致抗蚀剂,用于构成光致抗蚀剂的化合物,以及通过使用光致抗蚀剂形成图案的方法
- 专利标题: Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist
- 专利标题(中): 光致抗蚀剂,用于构成光致抗蚀剂的化合物,以及通过使用光致抗蚀剂形成图案的方法
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申请号: US763054申请日: 1996-12-10
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公开(公告)号: US5994025A公开(公告)日: 1999-11-30
- 发明人: Shigeyuki Iwasa , Kaichiro Nakano , Katsumi Maeda , Takeshi Ohfuji , Etsuo Hasegawa
- 申请人: Shigeyuki Iwasa , Kaichiro Nakano , Katsumi Maeda , Takeshi Ohfuji , Etsuo Hasegawa
- 申请人地址: JPX Tokyo
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-322039 19951211; JPX8-309742 19961120
- 主分类号: C08F220/04
- IPC分类号: C08F220/04 ; C08F220/06 ; C08F220/10 ; C08F220/18 ; C08F220/26 ; C08F220/28 ; C09D133/04 ; C09D133/14 ; G03F7/004 ; G03F7/039 ; H01L21/027
摘要:
There is provided a photoresist including (a) a resin composed of a polymer represented with the following general formula [1], and (b) a photo acid generator which produces acid when exposed to a light: ##STR1## wherein each of R.sup.1, R.sup.3 and R.sup.7 represents one of a hydrogen atom and a methyl group, R.sup.2 represents a hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.4 represents one of a hydrogen atom and a hydrocarbon group having a carbon number of 1 or 2, R.sup.5 represents a hydrocarbon group having a carbon number of 1 or 2, R.sup.6 represents one of (a) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive, (b) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an alkoxy group having a carbon number in the range of 1 to 12 both inclusive, and (c) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an acyl group having a carbon number in the range of 1 to 13 both inclusive, x+y+z=1, x is in the range of 0.1 to 0.9, y is in the range of 0.1 to 0.7, and z is in the range of 0 to 0.7. The resin has a weight percent in the range of 75 to 99.8 both inclusive, and the photo acid generator has a weight percent in the range of 0.2 to 25 both inclusive. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist has high resolution to thereby make it possible to form a fine pattern without resist residue.
公开/授权文献
- USD343472S Lighter 公开/授权日:1994-01-18