发明授权
- 专利标题： Processing assembly having a processing apparatus with an inclined processing path
- 专利标题（中）： 处理组件具有具有倾斜处理路径的处理装置
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申请号： US237450申请日： 1999-01-26
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公开(公告)号： US06010256A公开(公告)日： 2000-01-04
- 发明人: Ralph L. Piccinino, Jr. , Anthony Earle , Leslie R. Wells
- 申请人： Ralph L. Piccinino, Jr. , Anthony Earle , Leslie R. Wells
- 申请人地址： NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： NY Rochester
- 主分类号： G03D3/08
- IPC分类号： G03D3/08 ; G03D3/13 ; G03D5/00 ; G03D5/04 ; G03D3/02
摘要：
A processing apparatus for processing photosensitive material combines thin channel technology with nozzles, and an inclined processing path. Processing solution can be introduced into the inclined processing path so as to cause the solution to flow along the inclined processing path in a direction which is opposite to a direction of travel of the photosensitive material in the inclined processing path. With the arrangement of the present invention, photosensitive material can be processed in the first processing path by way of the nozzle spray arrangement and can be subjected to further processing along the inclined processing path.
公开/授权文献
- US4443767A Variable phase lock control 公开/授权日：1984-04-17
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