Invention Grant
- Patent Title: Polishing composition
- Patent Title (中): 抛光组成
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Application No.: US76116Application Date: 1998-05-12
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Publication No.: US6037260APublication Date: 2000-03-14
- Inventor: Ming-Shyong Tsai , Li-Mei Chen , Yue-Chin Yeh , Chiu-Chih Hsieh , Ying-Tsung Chen
- Applicant: Ming-Shyong Tsai , Li-Mei Chen , Yue-Chin Yeh , Chiu-Chih Hsieh , Ying-Tsung Chen
- Applicant Address: TWX Hsinchu TWX Taipei TWX Kaohsiung TWX Taipei TWX Kaohsiung Hsein TWX Taipei TWX Kaohsiung TWX Kaohsiung TWX Taipei
- Assignee: Industrial Technology Research Institute,Chang Chun Petrochemical Corporation,China Steel Corporation,Union Petrochemical Corporation,A-Green Corporation,China Petrochemical Development Corporation,Wah Hing Industrial Corporation,Eternal Chemical Corporation,Chinese Petroleum Corporation
- Current Assignee: Industrial Technology Research Institute,Chang Chun Petrochemical Corporation,China Steel Corporation,Union Petrochemical Corporation,A-Green Corporation,China Petrochemical Development Corporation,Wah Hing Industrial Corporation,Eternal Chemical Corporation,Chinese Petroleum Corporation
- Current Assignee Address: TWX Hsinchu TWX Taipei TWX Kaohsiung TWX Taipei TWX Kaohsiung Hsein TWX Taipei TWX Kaohsiung TWX Kaohsiung TWX Taipei
- Priority: TWX87102458 19980220
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14 ; H01L21/304 ; C07K13/00
Abstract:
The present invention provides a polishing composition which comprises 100 weight part of water; 0.5 to 20 weight part of boehmite, a hydroxide of aluminum, pseudoboehmite or mixtures thereof; 1 to 50 weight part of aluminum oxide (Al.sub.2 O.sub.3); and 1 to 20 weight part of an acidic solution. The polishing composition of the present invention is a thixotropic fluid and displays satisfactory suspension properties. Therefore, it is very suitable for use as a polishing slurry.
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