发明授权
- 专利标题： Magnetoresistive element with conductive films and magnetic domain films overlapping a central active area
- 专利标题（中）： 具有导电膜和磁畴膜的磁阻元件与中心有源区重叠
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申请号： US78484申请日： 1998-05-14
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公开(公告)号： US6040962A公开(公告)日： 2000-03-21
- 发明人: Kiyosumi Kanazawa , Yoshiro Nakagawa
- 申请人： Kiyosumi Kanazawa , Yoshiro Nakagawa
- 申请人地址： JPX Tokyo
- 专利权人： TDK Corporation
- 当前专利权人： TDK Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX9-124563 19970514
- 主分类号： G11B5/012
- IPC分类号： G11B5/012 ; G11B5/31 ; G11B5/39 ; H01L43/08
摘要：
The present invention is directed to an MR element and a thin film magnetic head that do not cause an increase in the electrical resistance value due to the presence of dead zones. When forming passive areas that include magnetic domain control films and conductive films at the two sides of a central active area through a vacuum film formation method, the magnetic domain control films are formed under film forming conditions that are different from the film forming conditions under which the conductive films are formed to ensure that the degree to which the conductive films overlap the central active area is set larger than the degree to which the magnetic domain control films overlap the central active area.
公开/授权文献
- USD401392S Cap with visor 公开/授权日：1998-11-24