发明授权
US6054254A Composition for underlying film and method of forming a pattern using
the film
失效
用于底膜的组合物和使用该膜形成图案的方法
- 专利标题： Composition for underlying film and method of forming a pattern using the film
- 专利标题（中）： 用于底膜的组合物和使用该膜形成图案的方法
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申请号： US108967申请日： 1998-07-02
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公开(公告)号： US6054254A公开(公告)日： 2000-04-25
- 发明人: Yasuhiko Sato , Yasunobu Onishi
- 申请人： Yasuhiko Sato , Yasunobu Onishi
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX9-178671 19970703
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004 ; G03F7/039 ; G03F7/09 ; G03F7/095 ; G03F7/20 ; G03C5/56 ; G03C1/76
摘要：
A method of forming a pattern which comprises the steps of forming an underlying film on a work film, forming a resist film on the underlying film, exposing the underlying film and the resist film to a patterning exposure light, and developing predetermined regions thus exposed of the resist film and the underlying film with a developing solution. The underlying film has a property that the solubility thereof to the developing solution can be changed by an action of an acid. The resist film and/or the underlying film contains a compound which is capable of generating the acid.
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