发明授权
- 专利标题： Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same
- 专利标题（中）： 感光性树脂组合物，感光性膜及使用其的荧光图案的制造方法以及进行了表面处理的荧光体及其制备方法
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申请号： US173008申请日： 1998-10-15
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公开(公告)号： US6077647A公开(公告)日： 2000-06-20
- 发明人: Hiroyuki Tanaka , Hideyasu Tsuiki , Takeshi Nojiri , Koichi Kamijima , Seiji Tai , Seikichi Tanno , Hajime Kakumaru
- 申请人： Hiroyuki Tanaka , Hideyasu Tsuiki , Takeshi Nojiri , Koichi Kamijima , Seiji Tai , Seikichi Tanno , Hajime Kakumaru
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi Chemical Co., Ltd.
- 当前专利权人： Hitachi Chemical Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX7-265557 19951013; JPX7-285790 19951102; JPX7-285791 19951102
- 主分类号： C09K11/02
- IPC分类号： C09K11/02 ; C09K11/08 ; G03F7/00 ; G03F7/027 ; G03F7/032 ; H01J9/00 ; H01J9/227 ; H01J17/49 ; H01J29/12
摘要：
Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.
公开/授权文献
- US5368141A Displacement sensitive valve mechanism 公开/授权日：1994-11-29