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14 条记录 (耗时 0.015 秒)

    Substituted acridine derivatives and application thereof
    2.
    发明授权
    Substituted acridine derivatives and application thereof 失效
    取代的吖啶衍生物及其应用

    公开(公告)号：US5045433A

    公开(公告)日：1991-09-03

    申请号：US529707

    申请日：1990-05-30

    申请人： Hajime Kakumaru ,  Yoshitaka Minami ,  Naohiro Kubota ,  Shinya Mashimo

    发明人： Hajime Kakumaru ,  Yoshitaka Minami ,  Naohiro Kubota ,  Shinya Mashimo

    IPC分类号： C07D401/04 ,  C08F2/50 ,  C08F2/58 ,  G03F7/031

    CPC分类号： C08F2/58 ,  G03F7/031 ,  Y10S430/121

    摘要： A substituted acridine derivative represented by ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are independently hydrogen atoms, alkyl groups, substituted alkyl groups, aryl groups, substituted aryl groups, halogen atoms, or alkoxy groups, and Z.sub.1 is a six-membered heteroaromatic group which has one or two nitrogen atoms in its ring and may have an alkyl substituent having 1 to 8 carbon atoms, or a quinolyl group; and a photopolymerizable composition comprising 0.01 to 10 parts by weight of said derivative, 100 parts by weight of a photopolymerizable compound having a boiling point of 100.degree. C. or higher at atmospheric pressure and at least one kind of ethylenic unsaturated group, and 0 to 400 parts by weight of a thermoplastic organic polymer.

    Process for producing adhesive film
    5.
    发明授权
    Process for producing adhesive film 失效
    粘合膜生产工艺

    公开(公告)号：US4312916A

    公开(公告)日：1982-01-26

    申请号：US186240

    申请日：1980-09-11

    申请人： Hajime Kakumaru ,  Nobuyuki Hayashi ,  Toshiaki Ishimaru ,  Kiyoshi Nakao ,  Tomohisa Ohta

    发明人： Hajime Kakumaru ,  Nobuyuki Hayashi ,  Toshiaki Ishimaru ,  Kiyoshi Nakao ,  Tomohisa Ohta

    IPC分类号： C08G18/63 ,  C09D4/06 ,  C09J4/02 ,  C09J4/06 ,  C09J7/02 ,  C09J175/04 ,  B05D3/06

    CPC分类号： C09J175/04 ,  C08G18/637 ,  C09D4/06 ,  C09J4/06 ,  C09J7/0246 ,  Y10T428/2809 ,  Y10T428/2896

    摘要： A process for producing adhesive film comprising coating on a filmlike substrate a composition comprising (i) a copolymer having a glass transition temperature of -30.degree. C. or lower and obtained from one or more monomers (a) such as alkyl acrylates or methacrylates, or the like, and another monomers (b) containing at least one carboxyl, alcoholic hydroxyl, or glycidyl group, (ii) a crosslinking agent having at least two crosslinkable functional groups which can react with the monomers (b), (iii) one or more monofunctional addition polymerizable monomers having a boiling point of 200.degree. C. or higher, (iv) one or more polyfunctional addition polymerizable monomers having a boiling point of 200.degree. C. or higher, and (v) a photochemical initiator, and irradiating said composition with actinic light, is advantageous in that the amount of solvent to be removed after coating the composition on the substrate can be reduced remarkably without lowering properties of the resulting adhesive film.

    摘要翻译： 一种制造粘合剂膜的方法，其包括在膜状基材上涂布组合物，所述组合物包含（i）玻璃化转变温度为-30℃以下并由一种或多种单体（a）如丙烯酸烷基酯或甲基丙烯酸烷基酯获得的共聚物， （b）含有至少一个羧基，醇羟基或缩水甘油基的单体（b），（ii）具有至少两个可与单体（b）反应的交联性官能团的交联剂，（iii）一种 或更多的沸点为200℃以上的单官能加聚单体，（iv）一种或多种沸点为200℃以上的多官能加聚单体和（v）光化学引发剂，以及照射 所述具有光化性光的组合物的优点在于，可以显着降低在基材上涂布组合物后除去的溶剂的量，而不会降低所得粘合剂膜的性能 。

    Aqueous alkali developable photosensitive composition and photosensitive laminate
    8.
    发明授权
    Aqueous alkali developable photosensitive composition and photosensitive laminate 失效
    水性碱显影光敏组合物和感光层压板

    公开(公告)号：US4562142A

    公开(公告)日：1985-12-31

    申请号：US655435

    申请日：1984-09-28

    申请人： Hajime Kakumaru ,  Nobuyuki Hayashi

    发明人： Hajime Kakumaru ,  Nobuyuki Hayashi

    IPC分类号： C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F220/30 ,  C08F290/00 ,  C08F291/06 ,  C08F299/00 ,  C08F299/02 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033 ,  G03C1/68

    CPC分类号： G03F7/033 ,  C08F220/30 ,  C08F291/06 ,  C08F299/024 ,  G03F7/027 ,  Y10S430/111

    摘要： Photosensitive composition comprising (a) an addition polymerizable compound of the general formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are hydrogen atom or methyl group, and n+m=8 to 12, (b) an addition-poymerizable compound of the general formula: ##STR2## wherein Z is a cyclic dibasic acid residue, R.sup.5 is a C.sub.1 to C.sub.3 alkylene group, R.sup.6 is hydrogen atom or methyl group, and R.sup.7 is hydrogen atom, methyl group, ethyl group or CH.sub.2 X in which X is chlorine atom or bromine atom, (c) a photoactivatable polymerization initiator, and (d) a linear copolymer having a carboxy content of 17 to 50% by mole, a water absorption of 4 to 30% by weight and a weight average molecular weight of 30,000 to 400,000. Photosensitive laminate having a photosensitive layer formed from the composition has an excellent resistance to plating liquids as well as excellent etching resistance, chemical resistance, adhesion property to boards and developing property.

    摘要翻译： 光敏组合物，其包含（a）通式为：其中R 1，R 2，R 3和R 4为氢原子或甲基，n + m = 8至12的加成聚合化合物，（b）加成 - 可聚合化合物 通式为：其中Z为环状二元酸残基，R5为C1〜C3亚烷基，R6为氢原子或甲基，R7为氢原子，甲基，乙基或CH2X，其中X 是氯原子或溴原子，（c）可光活化的聚合引发剂，和（d）具有羧基含量为17至50摩尔％，吸水率为4至30重量％，重均分子量 30,000到40万。 具有由该组合物形成的感光层的感光层压板具有优异的耐电镀性，以及优异的耐蚀刻性，耐化学性，与板的粘附性和显影性。

    Photosensitive resin composition
    9.
    发明授权
    Photosensitive resin composition 失效
    感光树脂组合物

    公开(公告)号：US4272607A

    公开(公告)日：1981-06-09

    申请号：US782378

    申请日：1977-03-29

    申请人： Katsushige Tsukada ,  Nobuyuki Hayashi ,  Hideo Yamada ,  Toshiaki Ishimaru ,  Hajime Kakumaru

    发明人： Katsushige Tsukada ,  Nobuyuki Hayashi ,  Hideo Yamada ,  Toshiaki Ishimaru ,  Hajime Kakumaru

    IPC分类号： C08F2/00 ,  C08F2/44 ,  C08F2/48 ,  C08F20/00 ,  C08F20/10 ,  G03F7/033 ,  H05K3/28 ,  G03C1/68

    CPC分类号： G03F7/033 ,  Y10S430/106

    摘要： A photosensitive resin composition comprising (a) a linear polymer or copolymer having tetrahydrofurfuryl groups at side chains, (b) one or more photopolymerizable unsaturated compounds having at least two terminal ethylene groups, and (c) one or more sensitizers which initiate polymerization of said unsaturated compounds by irradiation of active light, has excellent storage stability and photosensitivity. The composition can produce permanent protective films having excellent resistance to solvents, heat resistance and the like and can be used as a solder resist and the like.

    摘要翻译： 一种光敏树脂组合物，其包含（a）在侧链具有四氢糠基的直链聚合物或共聚物，（b）一种或多种具有至少两个末端亚乙基的可光聚合的不饱和化合物，和（c）一种或多种引发所述 不饱和化合物通过活性光照射，具有优异的储存稳定性和光敏性。 该组合物可以制造具有优异的耐溶剂性，耐热性等的永久保护膜，并且可以用作阻焊剂等。