发明授权
US6084673A Lithographic apparatus for step-and-scan imaging of mask pattern with
interferometer mirrors on the mask and wafer holders
失效
用于在掩模和晶片保持器上用干涉仪镜进行掩模图案的步进扫描成像的平版印刷设备
- 专利标题： Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders
- 专利标题（中）： 用于在掩模和晶片保持器上用干涉仪镜进行掩模图案的步进扫描成像的平版印刷设备
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申请号： US810793申请日： 1997-03-04
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公开(公告)号： US6084673A公开(公告)日： 2000-07-04
- 发明人: Marinus A. Van Den Brink , Alexander Straaijer
- 申请人： Marinus A. Van Den Brink , Alexander Straaijer
- 申请人地址： NLX Veldhoven
- 专利权人： ASM Lithography B.V.
- 当前专利权人： ASM Lithography B.V.
- 当前专利权人地址： NLX Veldhoven
- 优先权： EPX96200575 19960304
- 主分类号： G03F7/22
- IPC分类号： G03F7/22 ; G03F7/20 ; G03F9/00 ; H01L21/027 ; G01B9/02
摘要：
A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.