Invention Grant
- Patent Title: Method of spin-on-glass planarization
- Patent Title (中): 旋涂玻璃平面化方法
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Application No.: US215654Application Date: 1998-12-16
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Publication No.: US6117798APublication Date: 2000-09-12
- Inventor: Cheng-Yu Fang , Chih-Chiang Liu
- Applicant: Cheng-Yu Fang , Chih-Chiang Liu
- Applicant Address: TWX Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TWX Hsinchu
- Main IPC: H01L21/3105
- IPC: H01L21/3105 ; H01L21/314 ; H01L21/316 ; H01L21/31 ; H01L21/469
Abstract:
A method of spin-on-glass planarization. A spin-on-glass layer is formed on a substrate. An accuflo layer with a better fluidity than the spin-on-glass material is formed on the spin-on-glass layer. The accuflo layer and the spin-on-glass layer are etched back by two etching steps with different etching rate. The accuflo layer after being etched is stripped. A dielectric layer is formed.
Public/Granted literature
- US5406387A Facsimile apparatus capable of preventing receipt of unauthorized facsimile transmissions Public/Granted day:1995-04-11
Information query
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