发明授权
US6143668A KLXX technology with integrated passivation process, probe geometry and
probing process
失效
KLXX技术具有集成钝化过程,探头几何和探测过程
- 专利标题: KLXX technology with integrated passivation process, probe geometry and probing process
- 专利标题(中): KLXX技术具有集成钝化过程,探头几何和探测过程
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申请号: US941795申请日: 1997-09-30
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公开(公告)号: US6143668A公开(公告)日: 2000-11-07
- 发明人: M. Lawrence A. Dass , Kenneth D. Karklin , Krishna Seshan , Amir Roggel
- 申请人: M. Lawrence A. Dass , Kenneth D. Karklin , Krishna Seshan , Amir Roggel
- 申请人地址: CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/60
- IPC分类号: H01L21/60 ; H01L21/768 ; H01L23/485 ; H01L21/31
摘要:
A method of exposing a bond pad includes: providing an integrated circuit having a bond pad, a first passivation layer overlying an area portion of the bond pad, and a second passivation layer overlying the first passivation layer; removing a portion of the second passivation layer above the area portion of the bond pad exposing an area of the first passivation layer; curing the second passivation; and etching a portion of the exposed area of the first passivation layer to expose the top surface of the bond pad. A method of coupling an integrated circuit chip to a chip package is also disclosed as is a method of probing the bond pads of an integrated circuit. A probe card is further disclosed, including a probe assembly coupled to a printed circuit board, the probe assembly having a sloped sidewall portion with a plurality of probing beams extending from the sidewall portion.
公开/授权文献
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