发明授权
- 专利标题： Positive resist composition
- 专利标题（中）： 正抗蚀剂组成
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申请号： US428911申请日： 1999-10-28
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公开(公告)号： US6156481A公开(公告)日： 2000-12-05
- 发明人: Takanobu Takeda , Osamu Watanabe , Jun Watanabe , Jun Hatakeyama , Youichi Ohsawa , Toshinobu Ishihara
- 申请人： Takanobu Takeda , Osamu Watanabe , Jun Watanabe , Jun Hatakeyama , Youichi Ohsawa , Toshinobu Ishihara
- 申请人地址： JPX Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX10-307727 19981029
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039
摘要：
A hydroxystyrene-(meth)acrylate copolymer in which some phenolic hydroxyl groups are crosslinked with acid labile groups is blended as a base resin in a positive resist composition, which has the advantages of enhanced dissolution inhibition and an increased dissolution contrast after exposure.
公开/授权文献
- US5655733A Aircraft ground transporter 公开/授权日：1997-08-12
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