发明授权
- 专利标题： Organometallic polymers and use thereof
- 专利标题（中）： 有机金属聚合物及其用途
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申请号： US09350937申请日： 1999-07-12
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公开(公告)号： US06171757B2公开(公告)日： 2001-01-09
- 发明人: Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Ranee W. Kwong
- 申请人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Ranee W. Kwong
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
Compositions comprising a polymer of organometallic polymerizable monomer acid or ester are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.
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