发明授权
- 专利标题： Antireflective coating for photoresist compositions
- 专利标题（中）： 用于光致抗蚀剂组合物的抗反射涂层
-
申请号： US09368740申请日： 1999-08-05
-
公开(公告)号： US06187506B1公开(公告)日： 2001-02-13
- 发明人: Shuji Ding , Dinesh N. Khanna , Mark A. Spak , Dana L. Durham , Jianhui Shan , Eleazer Gonzalez
- 申请人： Shuji Ding , Dinesh N. Khanna , Mark A. Spak , Dana L. Durham , Jianhui Shan , Eleazer Gonzalez
- 主分类号： G03C500
- IPC分类号： G03C500
摘要：
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or mixture of solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and does not contain a crosslinking group.
信息查询
