利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

49 条记录 (耗时 0.021 秒)

    Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
    4.
    发明授权
    Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride 失效
    使用苯并内酯环化合物和重氮磺酰氯的重氮酯制造正性光致抗蚀剂图像的方法

    公开(公告)号：US5348842A

    公开(公告)日：1994-09-20

    申请号：US42362

    申请日：1993-04-02

    申请人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    发明人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    IPC分类号： G03F7/022 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

    CPC分类号： G03F7/022 ,  Y10S430/168

    摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

    摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中至少一个苯甲酸内酯环上的羟基已经被重氮化磺酰氯酯化，重氮磺酰氯由60至100摩尔％ 4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

    Process of making naphthoquinone diazide esters using lactone solvents
    5.
    发明授权
    Process of making naphthoquinone diazide esters using lactone solvents 失效
    使用内酯溶剂制备萘醌二叠氮酯的方法

    公开(公告)号：US5300396A

    公开(公告)日：1994-04-05

    申请号：US619154

    申请日：1990-11-28

    申请人： Dinesh N. Khanna ,  Robert E. Potvin

    发明人： Dinesh N. Khanna ,  Robert E. Potvin

    IPC分类号： G03C1/52 ,  C07C245/12 ,  C07C303/28 ,  C07C309/71 ,  C07C309/74 ,  C07C309/76 ,  C07C317/22 ,  C07C323/20 ,  G03F7/022

    CPC分类号： C07C303/28 ,  G03F7/0226 ,  C07C2102/10

    摘要： A method of preparing a photosensitizer condensate comprising: condensing a phenolic compound with a diazo sulfonyl chloride, wherein from about 50 to 100 mole percent of the diazo moiety is 2,1,4-diazo and from 0 to about 50 mole percent of the diazo moiety is 2,1,5 diazo; the phenolic compound having, on average, from about 60 mole percent to about 100 mole percent of its hydroxy groups esterified by the diazo sulfonyl chloride; wherein the condensing is conducted in a lactone solvent in the presence of an acid scavenger; and then subsequently isolating the photosensitizer condensate.

    摘要翻译： 一种制备光敏剂缩合物的方法，包括：将酚类化合物与重氮磺酰氯缩合，其中重氮部分的约50至100摩尔％为重氮基，重氮为0至约50摩尔％ 部分为2,1,5重氮; 酚类化合物平均具有由重氮磺酰氯酯化的约60摩尔％至约100摩尔％的羟基; 其中所述冷凝在酸清除剂存在下在内酯溶剂中进行; 然后随后分离光敏剂冷凝物。

    Heat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ether
    9.
    发明授权
    Heat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ether 失效
    来自双 - （（氨基羟基苯基）六氟异丙基）二苯基醚的耐热聚苯并恶唑

    公开(公告)号：US4939215A

    公开(公告)日：1990-07-03

    申请号：US327761

    申请日：1989-03-23

    申请人： Werner H. Mueller ,  Dinesh N. Khanna

    发明人： Werner H. Mueller ,  Dinesh N. Khanna

    IPC分类号： C08G69/26 ,  C08G69/32 ,  C08G73/22 ,  G02F1/1337 ,  G03F7/023 ,  G03F7/037 ,  H01B3/30

    CPC分类号： G02F1/133723 ,  C08G69/26 ,  C08G69/32 ,  C08G73/22 ,  G03F7/0233 ,  G03F7/037 ,  H01B3/303 ,  Y10T428/10

    摘要： Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.

    摘要翻译： 衍生自至少一种选自未取代的和取代的4,4'-双[2-（4-氨基-3-羟基苯基）六氟异丙基）]二苯基醚4,4'-二胺的二胺的耐热，可成形的羟基和/或烷氧基取代的聚酰胺 ' - 双 - [2-（3-氨基-4-羟基苯基）六氟异丙基]二苯醚和二羧酸或其衍生物例如 其酸卤素或酯。 本发明的聚酰胺可以被热固化以形成对于水解，化学和辐射攻击是稳定的较高耐热性的聚苯并恶唑。 本发明的聚酰胺可以通过模制，挤出和溶剂浇铸方法形成成型制品，优选在溶剂或稀释剂的存在下，然后任选地转化成耐热不溶性聚苯并恶唑。 这些成型制品在飞机，电子和其他商业应用中是有用的，其中需要耐热，耐化学性和耐辐射性以及良好的机械和电学性能。