发明授权
US06189484B1 Plasma reactor having a helicon wave high density plasma source
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具有螺旋波高密度等离子体源的等离子体反应器
- 专利标题: Plasma reactor having a helicon wave high density plasma source
- 专利标题(中): 具有螺旋波高密度等离子体源的等离子体反应器
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申请号: US09263642申请日: 1999-03-05
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公开(公告)号: US06189484B1公开(公告)日: 2001-02-20
- 发明人: Gerald Zheyao Yin , Chii Guang Lee , Arnold Kholodenko , Peter K. Loewenhardt , Hongching Shan , Diana Xiaobing Ma , Dan Katz
- 申请人: Gerald Zheyao Yin , Chii Guang Lee , Arnold Kholodenko , Peter K. Loewenhardt , Hongching Shan , Diana Xiaobing Ma , Dan Katz
- 主分类号: C23C1600
- IPC分类号: C23C1600
摘要:
A helicon wave, high density RF plasma reactor having improved plasma and contaminant control. The reactor contains a well defined anode electrode that is heated above a polymer condensation temperature to ensure that deposits of material that would otherwise alter the ground plane characteristics do not form on the anode. The reactor also contains a magnetic bucket for axially confining the plasma in the chamber using a plurality of vertically oriented magnetic strips or horizontally oriented magnetic toroids that circumscribe the chamber. The reactor may utilize a temperature control system to maintain a constant temperature on the surface of the chamber.
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