Invention Grant
- Patent Title: Auxiliary gasline-heating unit in chemical vapor deposition
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Application No.: US09577068Application Date: 2000-05-22
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Publication No.: US06322057B1Publication Date: 2001-11-27
- Inventor: Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Fu-Yang Yu
- Applicant: Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Fu-Yang Yu
- Main IPC: B01F304
- IPC: B01F304
Abstract:
An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N2 gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH3)2]4, from being condensed and becoming a gasline contaminant when the mixture mixes with the TDMAT and a carrier gas.
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