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    Carrier head for chemical mechanical polishing
    1.
    发明授权
    Carrier head for chemical mechanical polishing 有权
    化学机械抛光用载体头

    公开(公告)号：US06569771B2

    公开(公告)日：2003-05-27

    申请号：US10119676

    申请日：2002-04-11

    申请人： Juen-Kuen Lin ,  Tzu-Shin Chen ,  Chien-Hsin Lai ,  Yung-Tsung Wei

    发明人： Juen-Kuen Lin ,  Tzu-Shin Chen ,  Chien-Hsin Lai ,  Yung-Tsung Wei

    IPC分类号： H01L21302

    CPC分类号： B24B37/30 ,  H01L21/30625

    摘要： A new designed carrier head for chemical mechanical polishing is disclosed. The carrier head has a non-rigid incision ring having a downwardly-projecting non-rigid incision and surrounding a support plate of the carrier head instead of conventional incision or rip disposed in a conventional support plate. The carrier head also has a flexible membrane extending around the edges of the support plate, wherein the edge of the flexible membrane is at predetermined distance from the incision.

    摘要翻译： 公开了一种新的设计用于化学机械抛光的载体头。 载体头部具有非刚性切口环，其具有向下突出的非刚性切口并围绕载体头部的支撑板，而不是设置在常规支撑板中的常规切口或撕裂。 载体头还具有围绕支撑板的边缘延伸的柔性膜，其中柔性膜的边缘距离切口是预定的距离。

    Method for increasing working life of retaining ring in chemical-mechanical polishing machine
    2.
    发明授权
    Method for increasing working life of retaining ring in chemical-mechanical polishing machine 失效
    化学机械抛光机中保持环使用寿命的方法

    公开(公告)号：US06206758B1

    公开(公告)日：2001-03-27

    申请号：US09114435

    申请日：1998-07-13

    申请人： Chien-Hsin Lai ,  Juen-Kuen Lin ,  Peng-Yih Peng

    发明人： Chien-Hsin Lai ,  Juen-Kuen Lin ,  Peng-Yih Peng

    IPC分类号： B24B700

    CPC分类号： B24B37/32

    摘要： A method for increasing the working life of retaining rings in a chemical-mechanical polishing machine. The method includes adding an extra pad between a retaining ring and a carrier so that the retaining ring is prevented from slippage and pressure on wafer can be evenly spread over the polishing pad of a polishing machine. Therefore, the rate at which a retaining ring wears out in chemical-mechanical polishing operation can be greatly reduced, and the working life of a retaining ring can be doubled.

    摘要翻译： 一种增加化学机械抛光机中保持环的使用寿命的方法。 该方法包括在保持环和载体之间添加额外的垫，使得防止保持环滑动，并且可以将平均地分布在抛光机的抛光垫上的晶片上的压力。 因此，能够大大降低在化学机械抛光操作中保持环磨损的速度，并且保持环的使用寿命可以加倍。

    Chemical-mechanical polishing pad
    3.
    发明授权
    Chemical-mechanical polishing pad 有权
    化学机械抛光垫

    公开(公告)号：US6120366A

    公开(公告)日：2000-09-19

    申请号：US225367

    申请日：1999-01-04

    申请人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng ,  Edward Yang ,  Kun-Lin Wu ,  Fu-Yang Yu

    发明人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng ,  Edward Yang ,  Kun-Lin Wu ,  Fu-Yang Yu

    IPC分类号： B24B37/26 ,  B24D13/12 ,  B24D13/14 ,  H01L21/304 ,  B23F21/03 ,  B24B1/00

    CPC分类号： B24B37/26

    摘要： The invention provides a chemical-mechanical polishing pad, which includes a plurality of annular grooves and a plurality of streamline grooves designed according to principles of the hydrodynamics. The streamline grooves of polishing pad are designed according to flow equations derived from source flow and vortex flow, and the streamline grooves of polishing pad uniformly distribute the slurry on the polishing pad. An angle and a depth of the streamline groove, which are calculated by boundary layer effect of the streamline groove function, are used to design an optimum structure for polishing pad.

    摘要翻译： 本发明提供了一种化学机械抛光垫，其包括多个环形槽和根据流体动力学原理设计的多条流线槽。 抛光垫的流线槽根据源流和涡流的流动方程设计，抛光垫的流线槽将浆料均匀分布在抛光垫上。 使用由流线槽功能的边界层效应计算的流线槽的角度和深度来设计抛光垫的最佳结构。

    Cleaning system with automatically controlled brush pressure
    4.
    发明授权
    Cleaning system with automatically controlled brush pressure 有权
    具有自动控制刷压力的清洁系统

    公开(公告)号：US6119294A

    公开(公告)日：2000-09-19

    申请号：US232203

    申请日：1999-01-14

    申请人： Chien-Hsin Lai ,  Juen-Kuen Lin ,  Kun-Lin Wu ,  Peng-Yih Peng

    发明人： Chien-Hsin Lai ,  Juen-Kuen Lin ,  Kun-Lin Wu ,  Peng-Yih Peng

    IPC分类号： H01L21/00 ,  A46B13/02

    CPC分类号： H01L21/67046 ,  H01L21/6704

    摘要： An auto brush pressure cleaning system is described. The system includes a first pneumatic brush, a second pneumatic brush disposed to align with the first pneumatic brush adjacent and parallel to the first pneumatic brush, and a computer. The system also includes a first brush pressure regulator electrically coupled to the computer and transmitting a first and a second signal to the computer and a second brush pressure regulator coupled to the second pneumatic brush and the first brush pressure regulator through a first three-way valve and electrically coupled to the computer, wherein the second pneumatic brush transmits a third signal to the second brush pressure regulator and to the first brush pressure regulator and the second brush pressure regulator transmits a fourth signal to the computer. The system further includes a first electro-pressure regulator coupled to the first brush pressure regulator and the first pneumatic brush through a second three-way valve, wherein the first brush pressure regulator receives a fifth signal from the first pneumatic brush and a second electro-pressure regulator coupled to the second pneumatic brush and electrically coupled to the first electro-pressure regulator and the computer, wherein the computer transmits a sixth signal to the second and the first electro-pressure regulators.

    摘要翻译： 描述了一种自动刷式压力清洗系统。 该系统包括第一气动刷，设置成与第一气动刷相邻并平行于第一气动刷的第二气动刷以及计算机。 该系统还包括电耦合到计算机并将第一和第二信号传送到计算机的第一电刷压力调节器和通过第一三通阀耦合到第二气动刷和第一电刷压力调节器的第二电刷压力调节器 并且电耦合到所述计算机，其中所述第二气动刷将第三信号传输到所述第二电刷压力调节器和所述第一电刷压力调节器，并且所述第二电刷压力调节器将第四信号传输到所述计算机。 该系统还包括通过第二三通阀联接到第一电刷压力调节器和第一气动刷的第一电压调节器，其中第一电刷压力调节器接收来自第一气动刷的第五信号和第二电 - 耦合到第二气动刷并且电耦合到第一电压调节器和计算机的压力调节器，其中计算机向第二和第一电压调节器传输第六信号。

    Device for filtering slurry
    5.
    发明授权
    Device for filtering slurry 失效
    浆料过滤装置

    公开(公告)号：US6051139A

    公开(公告)日：2000-04-18

    申请号：US143582

    申请日：1998-08-31

    申请人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng

    发明人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng

    IPC分类号： B01D29/11 ,  B01D35/30 ,  B01D29/90 ,  B01D35/22

    CPC分类号： B01D35/30 ,  B01D29/114

    摘要： A filtering device used to filter the slurry is disclosed, including a crossflow fan within the filter housing, and a driving mechanism relative to the crossflow fan under the filter housing to drive the crossflow fan spinning to agitate the slurry in the filter housing, so as to prevent the particles in the slurry from adhering to the surface of the filter. The filtering device further includes a spoiler between the crossflow fan and the filter, so that larger particles remain circulating somewhere between the tip of the spoiler and the crossflow fan, instead of flowing to the filter, to prolong the lifetime of the filter.

    摘要翻译： 公开了用于过滤浆料的过滤装置，其包括过滤器壳体内的横流风扇，以及相对于过滤器壳体下方的横流风扇的驱动机构，以驱动横流风扇纺丝以搅拌过滤器壳体中的浆料，使得 以防止浆料中的颗粒粘附到过滤器的表面上。 过滤装置还包括在横流风扇和过滤器之间的扰流器，使得更大的颗粒保持循环在扰流器的尖端与横流风扇之间的某处，而不是流到过滤器，以延长过滤器的寿命。

    Auxiliary gasline-heating unit in chemical vapor deposition
    6.
    发明授权
    Auxiliary gasline-heating unit in chemical vapor deposition 有权
    化学气相沉积辅助加气线加热装置

    公开(公告)号：US06352244B2

    公开(公告)日：2002-03-05

    申请号：US09909498

    申请日：2001-07-20

    申请人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng ,  Fu-Yang Yu

    发明人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng ,  Fu-Yang Yu

    IPC分类号： B01F304

    CPC分类号： C23C16/45561 ,  C23C16/4482

    摘要： An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N2 gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH3)2]4, from being condensed and becoming a gasline contaminant when the mixture mixes with the TDMAT and a carrier gas.

    摘要翻译： 在化学气相沉积设备中使用辅助气体加热单元。 辅助气体线路加热装置用于增加N 2气体和He稀释气体混合物的出口温度，以防止混合物中的TDMAT，Ti [N（CH 3）2] 4被冷凝并成为气体线路污染物 与TDMAT和载气混合。

    Chemical mechanical polishing apparatus
    7.
    发明授权
    Chemical mechanical polishing apparatus 失效
    化学机械抛光装置

    公开(公告)号：US06341995B1

    公开(公告)日：2002-01-29

    申请号：US09522488

    申请日：2000-03-10

    申请人： Chien-Hsin Lai ,  Juen-Kuen Lin ,  Jung-Nan Tseng ,  Huang-Yi Lin ,  Kevin Yu

    发明人： Chien-Hsin Lai ,  Juen-Kuen Lin ,  Jung-Nan Tseng ,  Huang-Yi Lin ,  Kevin Yu

    IPC分类号： B24B4900

    CPC分类号： B24B37/11 ,  B24B41/007 ,  B24B49/12

    摘要： The present invention relates to improved chemical mechanical polishing apparatus, which reduce air sharp pressure on the polish head for preventing the breakage unpolished wafer. The improved chemical mechanical polishing apparatus of present invention is composed of a wafer head, a polish head, a damper and a sensor. The flowing speed of gas is reduced by making the diameter of the gas line connected to the damper air inlet smaller than the diameter of the gas line connected to the damper air outlet. The initial air sharp pressure is reduced and make &Dgr;P=Pwafer−Ppolish

    摘要翻译： 本发明涉及改进的化学机械抛光装置，其减少抛光头上的空气尖锐压力，以防止未磨光晶片破裂。 本发明改进的化学机械抛光装置由晶片头，抛光头，阻尼器和传感器构成。 通过使连接到阻尼器空气入口的气体管线的直径小于连接到阻尼器空气出口的气体管线的直径来减小气体的流动速度。 通过在入口和出口之间添加空气临时存储机，初始空气急剧压力降低，使DELTAP = Pwafer-Ppolish <0。 另外，将传感器放在空气临时存储器下的空气管路上，当浆料由于浆料隔膜的破裂而流入空气管路时，传感器将向改进的化学机械抛光装置的控制系统发送信号， 并使相关部件自动停止运转，避免破损。

    Retainer ring design for polishing head of chemical-mechanical polishing machine
    10.
    发明授权
    Retainer ring design for polishing head of chemical-mechanical polishing machine 失效
    化学机械抛光机抛光头保持环设计

    公开(公告)号：US6062963A

    公开(公告)日：2000-05-16

    申请号：US59750

    申请日：1998-04-14

    申请人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng ,  Hao-Kuang Chiu ,  Kun-Lin Wu

    发明人： Juen-Kuen Lin ,  Chien-Hsin Lai ,  Peng-Yih Peng ,  Hao-Kuang Chiu ,  Kun-Lin Wu

    IPC分类号： B24B37/04 ,  B24B57/02 ,  B24B5/00 ,  B24B47/02

    CPC分类号： B24B37/32 ,  B24B37/042 ,  B24B57/02

    摘要： A chemical-mechanical polishing machine having an improved wafer retainer ring design for the polishing head, comprising a polishing table, a polishing pad, a polishing head and a wafer retainer ring, wherein the polishing pad is above the polishing table, the polishing head is above the polishing pad, and the wafer retainer ring is mounted onto the polishing head. Improvement of the retainer ring design includes the formation of a plurality of guiding holes around the periphery of the retainer ring such that the guiding hole axis follows the centrifugal line produced by a rotating polishing head. Furthermore, the guiding hole has a gradual diffusing structure from the outer inlet to the inner outlet.

    摘要翻译： 一种具有用于抛光头的改进的晶片保持环设计的化学机械抛光机，包括抛光台，抛光垫，抛光头和晶片保持环，其中抛光垫在抛光台之上，抛光头是 在抛光垫上方，并且晶片保持环安装在抛光头上。 保持环设计的改进包括围绕保持环的周边形成多个引导孔，使得引导孔轴线遵循由旋转抛光头产生的离心线。 此外，引导孔具有从外部入口到内部出口的逐渐扩散结构。