Invention Grant
US06420199B1 Methods for fabricating light emitting devices having aluminum gallium indium nitride structures and mirror stacks 有权
制造具有铝镓铟氮化物结构和反射镜叠层的发光器件的方法

Methods for fabricating light emitting devices having aluminum gallium indium nitride structures and mirror stacks
Abstract:
Light emitting devices having a vertical optical path, e.g. a vertical cavity surface emitting laser or a resonant cavity light emitting or detecting device, having high quality mirrors may be achieved using wafer bonding or metallic soldering techniques. The light emitting region interposes one or two reflector stacks containing dielectric distributed Bragg reflectors (DBRs). The dielectric DBRs may be deposited or attached to the light emitting device. A host substrate of GaP, GaAs, InP, or Si is attached to one of the dielectric DBRs. Electrical contacts are added to the light emitting device.
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